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Mechanical and microstructural properties of broadband anti-reflective TiO2/SiO2 coatings for photovoltaic applications fabricated by magnetron sputtering
Solar Energy Materials and Solar Cells ( IF 6.3 ) Pub Date : 2021-01-01 , DOI: 10.1016/j.solmat.2020.110841
D.F. Zambrano , R. Villarroel , R. Espinoza-González , N. Carvajal , A. Rosenkranz , A.G. Montaño-Figueroa , M.J. Arellano-Jiménez , M. Quevedo-Lopez , P. Valenzuela , W. Gacitúa

Abstract Anti-reflective coatings are used in photovoltaic systems to minimize reflectance thus optimizing efficiency. Besides excellent optical properties, these coatings need to provide good mechanical properties due to hostile environmental conditions. Therefore, this study aims at designing anti-reflective coatings based upon multi-layers of TiO2 and SiO2 by magnetron sputtering on glass and silicon substrates at room temperature. Afterwards, these coatings were thermally annealed at 400, 500 and 600 °C to study the influence of such treatment on their optical and mechanical properties. Samples prepared at room temperature and annealed at 400 °C showed an optimized reflectance of about 2%. Advanced materials characterization techniques were used to elucidate the microstructural evolution of the multi-layers. The multi-layers annealed at 400 °C demonstrated a dense and smoothly packed microstructure with homogenous grains (50 nm in size), with a phase transformation from amorphous to anatase. In addition, exposure and damage of the glass substrate were detected for elevated temperatures (500 and 600 °C), thus increasing the reflectance. Nanoindentation revealed an improved hardness, elasticity, and resistance against plastic deformation for the sample annealed at 400 °C. Consequently, anti-reflective coatings with post-annealing treatment at 400 °C, unify two complementary aspects such as improved mechanical properties (extended durability) and enhanced collection abilities over a broader wavelength range (increased efficiency).

中文翻译:

磁控溅射制备的用于光伏应用的宽带抗反射 TiO2/SiO2 涂层的机械和微观结构特性

摘要 抗反射涂层用于光伏系统中,以最大限度地减少反射率,从而优化效率。除了出色的光学性能外,由于恶劣的环境条件,这些涂层还需要提供良好的机械性能。因此,本研究旨在通过磁控溅射在室温下在玻璃和硅基板上设计基于多层 TiO2 和 SiO2 的抗反射涂层。然后,这些涂层在 400、500 和 600 °C 下进行热退火,以研究这种处理对其光学和机械性能的影响。在室温下制备并在 400 °C 下退火的样品显示出约 2% 的优化反射率。先进的材料表征技术被用来阐明多层的微观结构演变。在 400 °C 下退火的多层显示出具有均匀晶粒(尺寸为 50 nm)的致密且平滑堆积的微观结构,并具有从非晶态到锐钛矿的相变。此外,在升高的温度(500 和 600 °C)下检测到玻璃基板的暴露和损坏,从而增加了反射率。纳米压痕表明,在 400 °C 下退火的样品具有改善的硬度、弹性和抗塑性变形能力。因此,在 400 °C 下进行后退火处理的抗反射涂层统一了两个互补的方面,例如改进的机械性能(延长的耐用性)和在更宽的波长范围内增强的收集能力(提高的效率)。从无定形到锐钛矿的相变。此外,在升高的温度(500 和 600 °C)下检测到玻璃基板的暴露和损坏,从而增加了反射率。纳米压痕表明,在 400 °C 下退火的样品具有改善的硬度、弹性和抗塑性变形能力。因此,在 400 °C 下进行后退火处理的抗反射涂层统一了两个互补的方面,例如改进的机械性能(延长的耐用性)和在更宽的波长范围内增强的收集能力(提高的效率)。从无定形到锐钛矿的相变。此外,在升高的温度(500 和 600 °C)下检测到玻璃基板的暴露和损坏,从而增加了反射率。纳米压痕表明,在 400 °C 下退火的样品具有改善的硬度、弹性和抗塑性变形能力。因此,在 400 °C 下进行后退火处理的抗反射涂层统一了两个互补的方面,例如改进的机械性能(延长的耐用性)和在更宽的波长范围内增强的收集能力(提高的效率)。以及在 400 °C 下退火的样品的抗塑性变形能力。因此,在 400 °C 下进行后退火处理的抗反射涂层统一了两个互补的方面,例如改进的机械性能(延长的耐用性)和在更宽的波长范围内增强的收集能力(提高的效率)。以及在 400 °C 下退火的样品的抗塑性变形能力。因此,在 400 °C 下进行后退火处理的抗反射涂层统一了两个互补的方面,例如改进的机械性能(延长的耐用性)和在更宽的波长范围内增强的收集能力(提高的效率)。
更新日期:2021-01-01
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