A surfactant system L64 and alcohol mixture was employed to exfoliate MoS2. To reduce the impact of surfactant on the quality of the nanosheet, the concentration of L64 was decreased to an extremely low value 0.0325 mM. Utilize common ultrasonic bath, the production yield of the nanosheet was increased to about 5% per hour, and statistical results from AFM showed that 40% of the nanosheet were less than 4 nm thick. Rheology characterization showed that surfactant alcohol mixtures were shear thinning fluid, yet the viscosity of L64 system varies directly with the shear rate in the high-speed shear region (higher than 400 s−1), and further affect the shear strength, therefore viscosity at high-speed shear can be considered as an indicator of the effectiveness for the exfoliation system. Exfoliated MoS2 was evaluated by hydrogen evolution reaction, and compared to the bulk MoS2, the 4 wt% Pt/FL-MoS2 improved the overpotential from 366 mV to 273 mV at 10 mA[Formula: see text]cm[Formula: see text]. This study presented a facile and effective route to fabricate 2D MoS2 with much less residue, and bring more opportunities to exploit clean and nontoxic system to exfoliate 2D materials.

中文翻译：

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液相剥离法控制表面活性剂少的溶剂流变剥离二硫化钼纳米片

表面活性剂体系 L64 和醇混合物用于剥离 MoS22. 为了减少表面活性​​剂对纳米片质量的影响，L64 的浓度降低到极低的值 0.0325 mM。利用普通超声波浴，纳米片的产量提高到每小时约 5%，AFM 的统计结果显示，40% 的纳米片厚度小于 4 nm。流变学表征表明，表面活性剂醇混合物为剪切稀化流体，而 L64 体系的粘度在高速剪切区（高于 400 s-1)，并进一步影响剪切强度，因此高速剪切下的粘度可被视为剥离系统有效性的指标。剥落的二硫化钼2通过析氢反应进行评估，并与块状 MoS2 进行比较2, 4 wt% Pt/FL-MoS2将 10 mA 时的过电位从 366 mV 提高到 273 mV[公式：见正文]cm[公式：见正文]。本研究提出了一种简便有效的方法来制造 2D MoS2残留物少得多，并带来更多机会利用清洁和无毒的系统去角质 2D 材料。