当前位置: X-MOL 学术Appl. Surf. Sci. › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Effect of pulse current density on microstructure and wear property of Ni-TiN nanocoatings deposited via pulse electrodeposition
Applied Surface Science ( IF 6.3 ) Pub Date : 2021-02-01 , DOI: 10.1016/j.apsusc.2020.148139
Fafeng Xia , Chaoyu Li , Chunyang Ma , Qiang Li , Haiyan Xing

Abstract TiN nanoparticles were utilized as reinforced phase to co-deposit with Ni ions for preparing Ni-TiN nanocoatings (NCs) in this research. The influence of pulse current density on microstructure, relative texture coefficient, microhardness and wear properties of Ni-TiN NCs was also examined. The results illustrate that the moderate nucleation quantity and the finest Ni embryos with average size of 141.6 nm were found in the coatings prepared at a pulse current density of 60 mA/cm2. The thicknesses of Ni-TiN NCs deposited at 20, 60 and 100 mA/cm2 were 50.7, 62.8, and 78.3 μm, respectively. The Ni-TiN NC fabricated at 60 mA/cm2 emerged the smoothest and the most compact surface morphology of all Ni-TiN coatings with Ra value of 29.57 nm. The XRD peaks of nickel in Ni-TiN NC deposited at 20 mA/cm2 has high intensity and are sharp, while XRD peaks of nickel in the NCs obtained at 60 and 100 mA/cm2 has lower intensity and are broader. XRD also illustrates that Ni and TiN phases were the main components of three Ni-TiN NCs. Microhardness value of the Ni-TiN NC deposited at 20 mA/cm2 is only 693.2 HV, which is the lowest value deposited among all three Ni-TiN NCs. However, the coating prepared at 60 mA/cm2 presents the highest microhardness value of 922.1 HV among these NCs. In addition, this coating exhibits a few slight scratches with few small pits, illustrating the best wear resistance.

中文翻译:

脉冲电流密度对脉冲电沉积Ni-TiN纳米涂层组织和磨损性能的影响

摘要 本研究以 TiN 纳米粒子作为增强相与 Ni 离子共沉积制备 Ni-TiN 纳米涂层 (NCs)。还研究了脉冲电流密度对 Ni-TiN NCs 的微观结构、相对织构系数、显微硬度和磨损性能的影响。结果表明,在60 mA/cm2的脉冲电流密度下制备的涂层中发现了中等的成核量和最细的Ni胚,平均尺寸为141.6 nm。以 20、60 和 100 mA/cm2 沉积的 Ni-TiN NC 的厚度分别为 50.7、62.8 和 78.3 μm。在 60 mA/cm2 下制造的 Ni-TiN NC 呈现出所有 Ni-TiN 涂层中最光滑和最紧凑的表面形态,Ra 值为 29.57 nm。以 20 mA/cm2 沉积的 Ni-TiN NC 中镍的 XRD 峰强度高且尖锐,而在 60 和 100 mA/cm2 下获得的 NC 中镍的 XRD 峰强度较低且较宽。XRD 还表明 Ni 和 TiN 相是三种 Ni-TiN NC 的主要成分。以 20 mA/cm2 沉积的 Ni-TiN NC 的显微硬度值仅为 693.2 HV,这是所有三种 Ni-TiN NC 中沉积的最低值。然而,在这些 NC 中,以 60 mA/cm2 制备的涂层的显微硬度值最高,为 922.1 HV。此外,该涂层显示出少量划痕和少量小凹坑,表明其耐磨性最佳。这是所有三种 Ni-TiN NC 中沉积的最低值。然而,在这些 NC 中,以 60 mA/cm2 制备的涂层的显微硬度值最高,为 922.1 HV。此外,该涂层显示出一些轻微的划痕和少量小凹坑,表明其耐磨性最佳。这是所有三种 Ni-TiN NC 中沉积的最低值。然而,在这些 NC 中,以 60 mA/cm2 制备的涂层的显微硬度值最高,为 922.1 HV。此外,该涂层显示出少量划痕和少量小凹坑,表明其耐磨性最佳。
更新日期:2021-02-01
down
wechat
bug