X-ray mirrors are an important part of the beam line in advanced light sources and have a stringent surface roughness, and monocrystalline silicon is the preferred substrate material for X-ray mirror. A method of improving the surface roughness of X-ray mirror, based on optimized density and dynamic viscosity of the polishing fluid, is analyzed and tested experimentally. The experimental results show that the surface roughness of monocrystalline silicon substrates was reduced significantly, with the root mean square of surface roughness decreasing from 0.420 nm to 0.272 nm, corresponding to an improvement of approximately 32%.

中文翻译：

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单晶硅衬底超光滑加工技术研究

X射线反射镜是先进光源中光束线的重要组成部分，具有严格的表面粗糙度，单晶硅是X射线反射镜的首选基板材料。对一种优化抛光液密度和动态粘度的提高X射线镜表面粗糙度的方法进行了实验分析和试验。实验结果表明，单晶硅衬底的表面粗糙度显着降低，表面粗糙度均方根从0.420 nm降低到0.272 nm，对应的改善幅度约为32%。