Optical and thermo-optical studies of hydrogenated amorphous silicon-rich nitride films were carried out. The films were produced by plasma-assisted chemical vapor deposition on glass. It is shown that the films deposited under appropriately selected processing conditions contain little nitrogen, as confirmed by Fourier-transform infrared spectroscopy therefore they are referred to as silicon-rich nitrides, a-SRN:H. Spectroscopic ellipsometry, reflectance, and transmittance spectroscopy were used to determine the optical indexes of the films and their thicknesses. It results from the ellipsometric measurements performed within a 190-1700nm spectral wavelength range that a-SRN:H films exhibit a high refractive index of about 3.7. It is also shown that post-deposition annealing up to 300°C does not affect the optical parameters of the films. Additionally, they are transparent in the near-infrared region, which makes them a good candidate for applications in various optoelectronic systems.

中文翻译：

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玻璃上高折射率等离子体沉积氢化非晶富硅氮化物薄膜的热光学特性

进行了氢化非晶富硅氮化物薄膜的光学和热光学研究。这些薄膜是通过等离子体辅助化学气相沉积在玻璃上产生的。It is shown that the films deposited under appropriately selected processing conditions contain little nitrogen, as confirmed by Fourier-transform infrared spectroscopy therefore they are referred to as silicon-rich nitrides, a-SRN:H. 使用光谱椭偏仪、反射率和透射率光谱来确定薄膜的光学指数和它们的厚度。它来自在 190-1700nm 光谱波长范围内进行的椭偏测量结果，a-SRN:H 薄膜显示出约 3.7 的高折射率。还表明，高达 300°C 的沉积后退火不会影响薄膜的光学参数。