Abstract A radio-frequency (RF), hollow-cathode plasma source with confining magnetic field is described for the chemical vapor deposition of thick ( > 10 µm), amorphous diamond-like carbon ablator films for inertial confinement fusion applications. Plasma is characterized by optical emission spectroscopy, while properties of the resultant films are measured by a combination of profilometry, Rutherford backscattering spectrometry, elastic recoil detection analysis, X-ray diffraction, Raman spectroscopy, and atomic force microscopy. The dependence of the deposition rate, film density, elemental composition, self-bias and residual stress is reported as a function of RF power. Higher density films were found when using Ar plasma, than N2 or H2 plasma. The coatings produced are x-ray amorphous, exhibit low compressive stress ( ~ 100 MPa), high density (

中文翻译：

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厚、低应力类金刚石碳膜的空心阴极化学气相沉积

摘要 描述了一种具有约束磁场的射频 (RF) 空心阴极等离子体源，用于化学气相沉积厚 (> 10 µm) 的非晶类金刚石碳烧蚀薄膜，用于惯性约束聚变应用。等离子体的特征在于发射光谱，而所得薄膜的特性则通过轮廓测量法、卢瑟福背散射光谱法、弹性反冲检测分析、X 射线衍射、拉曼光谱和原子力显微镜的组合来测量。沉积速率、薄膜密度、元素组成、自偏压和残余应力的相关性被报告为 RF 功率的函数。与 N2 或 H2 等离子体相比，使用 Ar 等离子体时发现了更高密度的薄膜。产生的涂层是 X 射线无定形的，具有低压缩应力 (~ 100 MPa)，