Cu_1-xFe_xO (x = 0, 2, 4, and 6 at. %) thin films were deposited on fluorine-doped tin oxide (FTO) substrates using the electrophoretic deposition (EPD) technique. Before the EPD process, Cu_1-xFe_xO powders were synthesized using the solid-state method. In this method, the powders are mechanically milled up to 9 h followed by annealing at 450 °C for 2 h. The XRD patterns reveal that all the investigated films are pure polycrystalline phase CuO, with monoclinic structure and without any traces of Fe or its oxides. The FESEM morphology observations of all the films confirm the constitution of grains whose average size varies from 100 to 250 nm. Moreover, increase in Fe dopant amount led to a change in the number and size of the particle agglomerations and the number of porosities. The effect of Fe dopant concentration on the optical constants of CuO films was studied using a UV–Vis spectrophotometer. The estimated band gap values shown blue-shifted from 1.23 eV for pure to 1.49 eV for Cu_0·94Fe_0.06O. Furthermere, the refractive index and Urbach energy values were determined, and the correlation between the results obtained with XRD data and FESEM morphology is discussed.

使用电泳沉积（EPD）技术将Cu _1-x Fe _x O（x = 0、2、4和6 at。％）薄膜沉积在掺氟氧化锡（FTO）衬底上。在EPD工艺之前，Cu _1-x Fe _x使用固态方法合成了O粉。在这种方法中，将粉末机械研磨长达9小时，然后在450°C下退火2小时。X射线衍射图谱表明，所有研究的薄膜都是纯多晶相CuO，具有单斜晶结构，没有任何痕量的Fe或其氧化物。所有膜的FESEM形态学观察证实了平均尺寸在100至250 nm之间变化的晶粒的组成。此外，Fe掺杂剂量的增加导致颗粒团聚的数量和尺寸以及孔隙率的改变。使用紫外可见分光光度计研究了Fe掺杂浓度对CuO薄膜光学常数的影响。显示的带隙估计值从纯的1.23 eV蓝变到Cu _0·94 Fe的1.49 eV蓝移_0.06 O.此外，确定了折射率和Urbach能量值，并讨论了用XRD数据获得的结果与FESEM形态之间的相关性。