Abstract This work presents the photocatalytic hydrogen production of ZnO–SnO2 thin films deposited by the magnetron co-sputtering technique varying the deposit conditions as power density and working pressure. As the power density of Sn increase, it was observed an increase in the presence of the SnO2 orthorhombic phase. Because of this increase, the number of defects generated in the films increases as it was corroborated by PL and XRD results. On the other hand, when the films were deposited at different working pressures, more significant optical and physicochemical changes were observed. The XRD results could be verified revealed that the working pressure could control the preferential orientation of the ZnO phase in the films. The working pressure also influenced the presence of two different SnO2 phases (orthorhombic and tetragonal). The surface roughness is also affected by the various working pressures since it increased when the deposits were made at low working pressures. The decrease in the roughness affects the transmittance percentage of the films, decreasing these to affecting the pass of the visible light. The photocatalytic efficiency was influenced by different structural defects that can act as electron traps or recombination centers.

中文翻译：

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ZnO-SnO2薄膜磁控共溅射沉积中功率密度和工作压力的影响及其对光催化制氢的影响

摘要 这项工作介绍了通过磁控共溅射技术沉积的 ZnO-SnO2 薄膜的光催化制氢，改变沉积条件，如功率密度和工作压力。随着 Sn 的功率密度增加，观察到 SnO2 正交相的存在增加。由于这种增加，薄膜中产生的缺陷数量增加，因为 PL 和 XRD 结果证实了这一点。另一方面，当薄膜在不同的工作压力下沉积时，观察到更显着的光学和物理化学变化。XRD 结果表明，工作压力可以控制薄膜中 ZnO 相的优先取向。工作压力也会影响两种不同的 SnO2 相（正交相和四方相）的存在。表面粗糙度也受各种工作压力的影响，因为在低工作压力下进行沉积时表面粗糙度会增加。粗糙度的降低影响薄膜的透射率百分比，降低这些以影响可见光的通过。光催化效率受不同结构缺陷的影响，这些缺陷可以作为电子陷阱或复合中心。