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Broad-beam plasma-cathode electron beam source based on a cathodic arc for beam generation over a wide pulse-width range
Review of Scientific Instruments ( IF 1.3 ) Pub Date : 2020-09-01 , DOI: 10.1063/5.0023172
A. V. Kazakov 1 , A. V. Medovnik 1 , E. M. Oks 1, 2 , N. A. Panchenko 1
Affiliation  

We describe the design, parameters, and characteristics of a modified wide-aperture, plasma-cathode electron beam source operating in the pressure range of 3 Pa-30 Pa and generating large-radius, low-energy (up to 10 keV) electron beams with a pulse width varying from 0.05 ms to 20 ms and a beam current up to several tens of amperes. A pulsed cathodic arc is used to generate the emission plasma, and a DC accelerating voltage is used to form the electron beam. Modernization of the design and optimization of the operating conditions of the electron source have provided a multiple increase in the pulse duration of the electron beam current and the corresponding increase in the beam energy per pulse, as compared to previously developed pulsed forevacuum electron sources.

中文翻译:

基于阴极电弧的宽束等离子体阴极电子束源,可在宽脉冲宽度范围内产生束流

我们描述了在 3 Pa-30 Pa 的压力范围内运行并产生大半径、低能量(高达 10 keV)电子束的改进型宽孔径等离子体阴极电子束源的设计、参数和特性脉冲宽度从 0.05 ms 到 20 ms 不等,束流高达几十安培。脉冲阴极电弧用于产生发射等离子体,直流加速电压用于形成电子束。与先前开发的脉冲前真空电子源相比,设计的现代化和电子源操作条件的优化提供了电子束电流脉冲持续时间的多倍增加和每个脉冲束能量的相应增加。
更新日期:2020-09-01
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