Abstract Atmospheric-pressure plasma polymerization of organosilicon precursors such as hexamethyldisiloxane is a well-known process used in the development of SixOyCz thin films on various substrates in different plasma configurations. Typically, long treatments or multi-pass treatments are used to achieve a sufficient thickness. However, the effects of multiple deposition passes on surface properties are rarely considered. In this paper, the development of a superhydrophobic organosilicon-based coating on pre-treated micro-roughened Al-6061 substrates through multiple deposition passes with an atmospheric-pressure plasma jet is reported. It is shown that besides the expected effect on coating's thickness, multiple passes of plasma deposition can also alter surface morphology and surface chemistry through a mechanism similar to the activation of organosilicon substrates with oxygen-containing plasmas. While the increase in coating thickness enhances coating stability in aggressive conditions, the rise of oxygen content reduces the hydrophobic behaviour of the coating.

中文翻译：

---

大气压等离子体射流中有机硅基超疏水涂层的多道沉积

摘要 有机硅前体（如六甲基二硅氧烷）的大气压等离子体聚合是众所周知的工艺，用于在不同等离子体配置的各种基材上开发 SixOyCz 薄膜。通常，使用长时间处理或多次处理来获得足够的厚度。然而，很少考虑多次沉积过程对表面特性的影响。在本文中，报道了通过使用大气压等离子射流进行多次沉积，在预处理的微粗糙 Al-6061 基材上开发出超疏水有机硅基涂层。结果表明，除了对涂层厚度的预期影响外，等离子体沉积的多次通过也可以通过类似于用含氧等离子体激活有机硅基板的机制改变表面形态和表面化学。虽然涂层厚度的增加提高了涂层在侵蚀性条件下的稳定性，但氧含量的增加会降低涂层的疏水性。