The nanoscale tribological characteristics of atomic-layered niobium diselenide (NbSe 2 ) were investigated using atomic force microscopy (AFM). Two-dimensional NbSe 2 atomic layers were produced on a weakly-adherent silicon wafer using two different methods: (1) mechanical exfoliation and (2) controlled synthesis via chemical vapor deposition. Using an AFM cantilever tip, a normal force was applied on the NbSe 2 atomic-scale thin films in order to measure friction force. The as-synthesized NbSe 2 thin films exhibited atomic lattice stick-slip friction, with the thinnest sheets showing a sliding length-dependent increase in static friction. This tendency is attributed to the increased susceptibility of the thinner chemically-synthesized NbSe 2 sheets toward out-of-plane elastic deformation.

中文翻译：

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化学气相沉积生长原子级二硒化铌的摩擦学特性

使用原子力显微镜（AFM）研究了原子层二硒化铌（NbSe 2）的纳米级摩擦学特性。二维NbSe 2原子层是使用两种不同的方法在弱粘附的硅片上生产的：（1）机械剥离和（2）通过化学气相沉积进行的受控合成。使用AFM悬臂尖端，在NbSe 2原子级薄膜上施加法向力以测量摩擦力。刚合成的NbSe 2薄膜表现出原子晶格粘滑摩擦，而最薄的片材则显示出滑动长度随静摩擦而增加。这种趋势归因于更薄的化学合成的NbSe 2薄板对面外弹性变形的敏感性增加。