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Tribological characteristics of atomic-scale niobium diselenide grown via chemical vapor deposition
Applied Physics Express ( IF 2.3 ) Pub Date : 2020-09-27 , DOI: 10.35848/1882-0786/abb91b
Won-Sang Shin 1 , ChangKyoo Park 2 , Juyeon Seo 1 , Dong-Hyuck Jung 1 , Eun Choi 1 , Moonsang Lee 3 , Un Jeong Kim 4 , Myung Gwan Hahm 1 , Yoon-Jun Kim 1
Affiliation  

The nanoscale tribological characteristics of atomic-layered niobium diselenide (NbSe 2 ) were investigated using atomic force microscopy (AFM). Two-dimensional NbSe 2 atomic layers were produced on a weakly-adherent silicon wafer using two different methods: (1) mechanical exfoliation and (2) controlled synthesis via chemical vapor deposition. Using an AFM cantilever tip, a normal force was applied on the NbSe 2 atomic-scale thin films in order to measure friction force. The as-synthesized NbSe 2 thin films exhibited atomic lattice stick-slip friction, with the thinnest sheets showing a sliding length-dependent increase in static friction. This tendency is attributed to the increased susceptibility of the thinner chemically-synthesized NbSe 2 sheets toward out-of-plane elastic deformation.

中文翻译:

化学气相沉积生长原子级二硒化铌的摩擦学特性

使用原子力显微镜(AFM)研究了原子层二硒化铌(NbSe 2)的纳米级摩擦学特性。二维NbSe 2原子层是使用两种不同的方法在弱粘附的硅片上生产的:(1)机械剥离和(2)通过化学气相沉积进行的受控合成。使用AFM悬臂尖端,在NbSe 2原子级薄膜上施加法向力以测量摩擦力。刚合成的NbSe 2薄膜表现出原子晶格粘滑摩擦,而最薄的片材则显示出滑动长度随静摩擦而增加。这种趋势归因于更薄的化学合成的NbSe 2薄板对面外弹性变形的敏感性增加。
更新日期:2020-09-28
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