Post‐Assembly Photomasking of Potassium Acyltrifluoroborates (KATs) for Two‐Photon 3D Patterning of PEG‐Hydrogels,Helvetica Chimica Acta

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Post‐Assembly Photomasking of Potassium Acyltrifluoroborates (KATs) for Two‐Photon 3D Patterning of PEG‐Hydrogels
Helvetica Chimica Acta ( IF 1.5 ) Pub Date : 2020-09-27 , DOI: 10.1002/hlca.202000172
Jeffrey W. Bode ₁ , Haewon Song ₂ , Dino Wu ₂ , Dimitry Mazunin ₃ , Sizhou M. Liu ₃ , Yoshikatsu Sato ₄ , Nicolas Broguiere ₅ , Marcy Zenobi-Wong ₆

Affiliation

Chemical ligation reactions of functional groups that can be masked with two‐photon labile protecting groups provide a powerful technology for the three‐dimensional patterning of molecules – including proteins – onto hydrogel scaffolds. In order to utilize readily prepared hydrogels constructed by the potassium acyltrifluoroborate (KAT)‐hydroxylamine amide formation ligation for two‐photon patterning, we have developed a unique post‐polymerization protecting group strategy through the reaction of KATs and dithiols in water and deprotection by two‐photon excitation. After precise 3D spatially confined light irradiation, the unprotected KATs undergo ligations with hydroxylamine‐functionalized superfolder GFP and sulforhodamine B for the composition of three‐dimensional patterns.

中文翻译：

组装后的三氟硼酸钾（KAT）的光掩膜用于PEG水凝胶的双光子3D图案化

可以被两个光子不稳定的保护基团掩盖的官能团的化学连接反应，为在水凝胶支架上对分子（包括蛋白质）进行三维构图提供了强大的技术。为了利用由酰基三氟硼酸钾（KAT）-羟胺酰胺形成连接体构建的易于制备的水凝胶进行双光子图案化，我们通过KAT和二硫醇在水中反应并通过两个脱保护来开发了独特的聚合后保护基策略-光子激发。经过精确的3D空间限制光照射后，未保护的KAT与羟胺官能化的超级文件夹GFP和磺基罗丹明B进行连接，形成三维图案。

更新日期：2020-11-25

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