Abstract. A calibration method of shear amount based on the optical layout of point source microscope (PSM) for lateral shearing interferometric (LSI) wavefront sensor is proposed. A simulation model of quadriwave LSI is introduced to analyze the influence of the window size of the spatial filter and the shear amount on the accuracy of the shearing wavefront feature extraction (SWFE) method. Simulation results show that the accuracy of the SWFE method deteriorates at small shear amounts. The proposed calibration method makes use of the optical layout of PSM to generate spot images of the point source at the detector plane of the sensor itself. The shear amount is calibrated by the relationship between the lateral distance of the spot images and the distribution of the diffraction orders of the grating. In the experiments, an SID4 wavefront sensor and a circular-aperture modified Hartmann mask LSI wavefront sensor are calibrated by the proposed method. A phase plate etched with patterns has been manufactured as the test specimen. The etching depth is characterized by the two wavefront sensors, and the testing results are compared with that by a commercial ZYGO® interferometer. The feasibility and accuracy of the proposed calibration method are validated. This calibration method provides an easily conducted approach for calibrating the shear amount of LSI wavefront sensor with high accuracy.

中文翻译：

---

基于点源显微镜光学布局的横向剪切干涉波前传感器剪切量标定方法

摘要。提出了一种基于点源显微镜(PSM)光学布局的横向剪切干涉(LSI)波前传感器剪切量标定方法。引入四波LSI仿真模型，分析空间滤波器窗口大小和剪切量对剪切波前特征提取(SWFE)方法精度的影响。模拟结果表明，SWFE 方法的精度在较小的剪切量下会恶化。所提出的校准方法利用 PSM 的光学布局在传感器本身的探测器平面上生成点源的点图像。剪切量通过光斑图像横向距离与光栅衍射级分布的关系进行标定。在实验中，SID4 波前传感器和圆形孔径修正哈特曼掩模 LSI 波前传感器通过所提出的方法进行校准。已制造蚀刻有图案的相位板作为测试样品。蚀刻深度由两个波前传感器表征，测试结果与商用 ZYGO®干涉仪进行比较。验证了所提出的校准方法的可行性和准确性。这种校准方法为高精度校准LSI波前传感器的剪切量提供了一种易于实施的方法。并将测试结果与商用 ZYGO®干涉仪进行比较。验证了所提出的校准方法的可行性和准确性。这种校准方法为高精度校准LSI波前传感器的剪切量提供了一种易于实施的方法。并将测试结果与商用 ZYGO®干涉仪进行比较。验证了所提出的校准方法的可行性和准确性。这种校准方法为高精度校准LSI波前传感器的剪切量提供了一种易于实施的方法。