Abstract During the annealing of Ni and Ni-Mo films, a {110} texture, usually considered to be both of high surface energy and high strain energy, was found to develop. Quantitative thermodynamic model calculations showed that the anomalous formation of this {110} texture originates fundamentally from the grain yielding anisotropy of Ni. Based on extensive grain yielding anisotropy model calculations, a “texture map” based on {111}, {100}, and {110} textures was constructed to predict the texture transition temperatures for different film thicknesses. A kinetic analysis of the texture evolution in the films is further presented, revealing that the texture evolution is controlled by the self-diffusion of atoms at grain boundaries. These findings pave the way for the achievement of unusual surface orientations through the quantitative texture design of thin films.

中文翻译：

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Ni和Ni-Mo合金晶粒屈服各向异性引起的异常织构发展

摘要 在 Ni 和 Ni-Mo 薄膜的退火过程中，发现通常被认为具有高表面能和高应变能的 {110} 织构形成。定量热力学模型计算表明，这种 {110} 织构的异常形成主要源于镍的晶粒产生各向异性。基于广泛的晶粒屈服各向异性模型计算，构建了基于 {111}、{100} 和 {110} 纹理的“纹理图”来预测不同薄膜厚度的纹理转变温度。进一步介绍了薄膜中织构演变的动力学分析，表明织构演变是由晶界处原子的自扩散控制的。