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Exciton diffusion inhBN-encapsulated monolayerMoSe2
Physical Review B ( IF 3.2 ) Pub Date : 2020-09-21 , DOI: 10.1103/physrevb.102.115424
Takato Hotta , Shohei Higuchi , Akihiro Ueda , Keisuke Shinokita , Yuhei Miyauchi , Kazunari Matsuda , Keiji Ueno , Takashi Taniguchi , Kenji Watanabe , Ryo Kitaura

Excitons, quasiparticles composed of an electron and a hole, play an important role in optical responses in low-dimensional nanostructures. In this work, we have investigated exciton diffusion in monolayer MoSe2 encapsulated between flakes of hexagonal boron nitride (hBN/MoSe2/hBN). Through photoluminescence imaging and numerical solution of the two-dimensional diffusion equation, we revealed that temperature dependence of exciton mobility, μex, in hBN/MoSe2/hBN shows a nonsaturating increase at low temperature, which is qualitatively different from those of quantum wells composed of compound semiconductors. The ultraflat structure of monolayer MoSe2 in hBN/MoSe2/hBN probably leads to the suppression of charged-impurity scattering and surface-roughness scattering.

中文翻译:

激子扩散inhBN包裹的单层MoSe2

激子是由电子和空穴组成的准粒子,在低维纳米结构的光学响应中起着重要作用。在这项工作中,我们研究了激子在单层中的扩散2 封装在六方氮化硼薄片之间(H国阵/硫化钼Ë2/H国阵)。通过光致发光成像和二维扩散方程的数值解,我们发现激子迁移率的温度依赖性,μ,在 H国阵/硫化钼Ë2/H国阵图1显示了在低温下的非饱和增加,这在质量上与由化合物半导体组成的量子阱的增加不同。单层的超扁平结构2H国阵/硫化钼Ë2/H国阵 可能导致带电杂质散射和表面粗糙度散射的抑制。
更新日期:2020-09-22
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