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STUDYING THE MICROSTRUCTURE OF Pt LAYERS PREPARED BY CHEMICAL VAPOR DEPOSITION IN THE PRESENCE OF HYDROGEN
Journal of Structural Chemistry ( IF 1.2 ) Pub Date : 2020-08-01 , DOI: 10.1134/s0022476620080053
S. I. Dorovskikh , D. D. Klyamer , T. P. Koretskaya , D. B. Kal′nyi , N. B. Morozova

Platinum layers with developed surface areas are prepared for the first time on the contacts of diagnostic electrodes by chemical vapor deposition using the adduct between hexafluoroacetylacetonate-trimethylplatinum(IV) and pyridine used as the precursor in an atmosphere of hydrogen. The effect of the reagent gas concentration, deposition temperature, and gas phase activation temperature on the composition and microstructure of the films is studied by EDS, powder XRD, SEM, and Raman spectroscopy methods. The conditions of depositing films with minimal impurity contents are determined, the possibility of preparing layers with a fractal-like surface structure is demonstrated. The growth rate of the sample in the presence of hydrogen is shown to reach 3.2 nm/min. The regimes for the precipitation of functional layers on electrode contacts (capacitance values of 2.2-9.2 µF/cm2) and on Ti discs are determined.

中文翻译:

研究在氢气存在下通过化学气相沉积制备的 Pt 层的微观结构

使用六氟乙酰丙酮-三甲基铂 (IV) 和吡啶之间的加合物在氢气气氛中作为前体,通过化学气相沉积,首次在诊断电极的触点上制备了具有发达表面积的铂层。通过EDS、粉末XRD、SEM和拉曼光谱方法研究了反应气浓度、沉积温度和气相活化温度对薄膜组成和微观结构的影响。确定了沉积具有最小杂质含量的薄膜的条件,证明了制备具有分形表面结构的层的可能性。样品在氢气存在下的生长速率达到 3.2 nm/min。
更新日期:2020-08-01
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