This work aims to investigate the photocatalytic hydrogen evolution over acid (citric acid and hydrochloric acid) etched strontium titanate (SrTiO₃), which is promoted by 1 wt% platinum (Pt) as co-catalyst. Scanning electron microscopy (SEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and ultraviolet–visible spectroscopy (UV–Vis) analyses of the un-etched and etched SrTiO₃ are presented; the results indicate that etching affects the surface structure while it does not change the bulk properties of semiconductor. The results of the photocatalytic activity tests performed in a methanol solution using a semi-batch reaction system equipped with argon flow to collect hydrogen, 300 W xenon lamp as light source and gas chromatograph for the analysis, are also reported. The etching with 4 mol L⁻¹ citric acid increases the hydrogen evolution rate about 20% while the highest rate of hydrogen production over etched Pt-SrTiO₃ is about 550 µmol/gcat.h at the 6 h of the reaction test.

这项工作旨在研究在酸（柠檬酸和盐酸）蚀刻的钛酸锶（SrTiO ₃）上的光催化制氢反应，钛酸锶由1 wt％的铂（Pt）作为助催化剂促进。扫描电子显微镜（SEM），X射线衍射（XRD），X射线光电子能谱（XPS）和紫外可见光谱（UV-Vis）对未蚀刻和蚀刻后的SrTiO _3的分析提出; 结果表明，蚀刻会影响表面结构，但不会改变半导体的整体性能。还报告了在甲醇溶液中使用配有氩气收集氢气的半间歇反应系统，300 W氙灯作为光源和气相色谱仪进行分析的光催化活性测试的结果。在反应测试的6小时内，用4 mol L ^-1柠檬酸进行蚀刻可将氢气释放速率提高约20％，而在蚀刻后的Pt-SrTiO _3上，最高产氢速率约为550 µmol / gcat.h。