Transfer printing is an emerging assembly technique for flexible and stretchable electronics. Although a variety of transfer printing methods have been developed, transferring patterns with nanometer resolution remains challenging. We report a sacrificial layer-assisted nanoscale transfer printing method. A sacrificial layer is deposited on a donor substrate, and ink is prepared on and transferred with the sacrificial layer. Introducing the sacrificial layer into the transfer printing process eliminates the effect of the contact area on the energy release rate (ERR) and ensures that the ERR for the stamp/ink-sacrificial layer interface is greater than that for the sacrificial layer/donor interface even at a slow peel speed (5 mm s⁻¹). Hence, large-area nanoscale patterns can be successfully transferred with a yield of 100%, such as Au nanoline arrays (100 nm thick, 4 mm long and 47 nm wide) fabricated by photolithography techniques and PZT nanowires (10 mm long and 63 nm wide) fabricated by electrohydrodynamic jet printing, using only a blank stamp and without the assistance of any interfacial chemistries. Moreover, the presence of the sacrificial layer also enables the ink to move close to the mechanical neutral plane of the multilayer peel-off sheet, remarkably decreasing the bending stress and obviating cracks or fractures in the ink during transfer printing.

转移印刷是一种新兴的柔性可拉伸电子产品组装技术。尽管已经开发了多种转移印刷方法，但以纳米分辨率转移图案仍然具有挑战性。我们报告了一种牺牲层辅助的纳米级转移印刷方法。将牺牲层沉积在供体基底上，并且在牺牲层上制备墨水并用牺牲层转移墨水。在转移印刷过程中引入牺牲层消除了接触面积对能量释放率（ERR）的影响，并确保印模/油墨-牺牲层界面的ERR大于牺牲层/供体界面的ERR以慢剥离速度(5mm s ^-1 )。因此，大面积纳米级图案可以以100%的产率成功转移，例如通过光刻技术制造的Au纳米线阵列（100 nm厚、4 mm长、47 nm宽）和PZT纳米线（10 mm长、63 nm）宽）通过电流体动力喷射打印制造，仅使用空白印章，无需任何界面化学的帮助。此外，牺牲层的存在还使得油墨能够移动到靠近多层剥离片的机械中性面，显着降低弯曲应力并避免转印过程中油墨的裂纹或断裂。