The high entropy nitride coatings (Cr_0.35Al_0.25Nb_0.12Si_0.08V_0.20)N with high hardness of 35 GPa and a high H³/E² of 0.52 were fabricated by RF magnetron sputtering system via tuning the processing parameters, such as substrate temperature and bias. The chemical composition, crystal structure, grain size, and residual stress were measured and analyzed to determine the mechanisms of hardness improvement. The crystal structure maintained B1 face-center cubic structure throughout all the conditions. The hardness was improved from 28 GPa to 35 GPa by sputtering at 300 °C with −150 V bias. Such hardness was achieved due to increased densification and compressive residual stress. Furthermore, the wear test of high hardness and high value of H³/E² coatings were performed at both ambient temperature and 600 °C. The correlation among H³/E², oxidation resistance, and wear rate was addressed and discussed.

具有35 GPa的高硬度和H ³ / E ^2的高硬度的高熵氮化物涂层（Cr _0.35 Al _0.25 Nb _0.12 Si _0.08 V _0.20）N射频磁控溅射系统通过调整工艺参数（例如衬底温度和偏压）制造了0.52的纳米线。测量和分析化学成分，晶体结构，晶粒尺寸和残余应力，以确定硬度提高的机理。在所有条件下，晶体结构均保持B1面心立方结构。通过在300°C下以-150 V偏压溅射将硬度从28 GPa提高到35 GPa。由于增加的致密化和压缩残余应力而获得这种硬度。另外，在环境温度和600℃下都进行了高硬度和高值H ³ / E ²涂层的磨损试验。H ³ / E ²之间的相关性，抗氧化性和磨损率已得到解决和讨论。