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Relativistic multiconfiguration Dirac–Fock calculations of photoionization/electron-impact ionization, auger decay, and relaxed-orbital oscillations of Cu ions
Journal of Electron Spectroscopy and Related Phenomena ( IF 1.8 ) Pub Date : 2020-12-01 , DOI: 10.1016/j.elspec.2020.146994
Zhongrui Li , Udo Becker

Abstract Core-hole creation and decay are of tremendous importance in both theory and applications. However, different ionization approaches and decay channels, especially at L-shell, bring many challenges to accurate simulation. In order to understand the ionization state effects on the creation and decay at L-shell hole, we performed a theoretical study of photon/electron-impact L-shell ionization of differently charged copper ions and the subsequent Auger electron and fluorescence emission by using the relativistic multiconfiguration Dirac–Fock approach. It was found that photoionization has much larger cross sections than electron-impact ionization near the ionization threshold, but smaller ones at higher impact energies. The ionization cross sections for 2s-sublevels are negligibly small compared with those for 2p-sublevels for both photon and electron impact ionizations. Additionally, the ionization cross sections decrease with the ionization state for both electron- and photon- impact L-shell ionizations. Similar to radiative (fluorescence) decay, Auger kinetic energy and yield decrease with ionization state, and the energy gaps and rate ratios between major Auger transitions change with ionization state. Furthermore, Auger rates from the L-shell decay are much larger than fluorescence rates, and the Auger-to-fluoresce decay ratio slightly decreases with increase in the ionization state of Cu ion.

中文翻译:

铜离子的光电离/电子碰撞电离、螺旋衰减和松弛轨道振荡的相对论多构型狄拉克-福克计算

摘要 岩心孔的产生和衰减在理论和应用中都具有重要意义。然而,不同的电离方法和衰变通道,尤其是在 L 壳层,给精确模拟带来了许多挑战。为了了解电离态对 L 壳孔的产生和衰变的影响,我们对不同带电铜离子的光子/电子影响 L 壳电离以及随后的俄歇电子和荧光发射进行了理论研究,使用相对论多重配置 Dirac-Fock 方法。发现在电离阈值附近,光电离的横截面比电子撞击电离的横截面大得多,但在较高的撞击能量下横截面较小。与光子和电子碰撞电离的 2p 亚能级相比,2s 亚能级的电离截面小到可以忽略不计。此外,对于电子和光子碰撞 L 壳层电离,电离截面随着电离状态的增加而减小。与辐射(荧光)衰变类似,俄歇动能和产率随电离状态而降低,主要俄歇跃迁之间的能隙和速率比随电离状态而变化。此外,来自 L 壳衰减的俄歇速率远大于荧光速率,并且俄歇与荧光衰减比随着 Cu 离子电离状态的增加而略有下降。与辐射(荧光)衰变类似,俄歇动能和产率随电离状态而降低,主要俄歇跃迁之间的能隙和速率比随电离状态而变化。此外,来自 L 壳衰减的俄歇速率远大于荧光速率,并且俄歇与荧光衰减比随着 Cu 离子电离状态的增加而略有下降。与辐射(荧光)衰变类似,俄歇动能和产率随电离状态而降低,主要俄歇跃迁之间的能隙和速率比随电离状态而变化。此外,来自 L 壳衰减的俄歇速率远大于荧光速率,并且俄歇与荧光衰减比随着 Cu 离子电离状态的增加而略有下降。
更新日期:2020-12-01
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