Abstract Vinyltriethoxysilane (VS) films with improved corrosion resistance and uniform thickness (∼2.8 μm) were fabricated on low carbon steel using a novel chemical etching method. The film forming mechanism occurred on the etched metal was investigated by experimental and theoretical methods. Results reveal that the metal hydroxylation and micro-rough surface generated in H2O2-containing etchant contribute to the enhancement of interfacial adhesion and protective performance for self-assembled films. However, there is an optimal etching time about 4 min forming denser interfacial layer with high adhesion of grade 1. Prolonged etching will cause inversely deterioration of the formed VS films.

中文翻译：

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使用新型化学蚀刻方法提高低碳钢上自组装乙烯基三乙氧基硅烷 (VS) 膜的耐腐蚀性和机理分析

摘要 使用新型化学蚀刻方法在低碳钢上制备了具有提高的耐腐蚀性和均匀厚度（~2.8 μm）的乙烯基三乙氧基硅烷 (VS) 薄膜。通过实验和理论方法研究了蚀刻金属上的成膜机制。结果表明，在含 H2O2 的蚀刻剂中产生的金属羟基化和微粗糙表面有助于增强自组装膜的界面附着力和保护性能。然而，最佳蚀刻时间约为 4 分钟，以形成具有 1 级高附着力的更致密的界面层。长时间的蚀刻将导致所形成的 VS 膜逆向恶化。