Ultra-thin films of solution-exfoliated hexagonal boron nitride by Langmuir deposition,Journal of Materials Chemistry C

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Ultra-thin films of solution-exfoliated hexagonal boron nitride by Langmuir deposition
Journal of Materials Chemistry C ( IF 5.7 ) Pub Date : 2020-09-17 , DOI: 10.1039/d0tc02933e
Azam Nasr Esfahani _{1,

2,

3,

4,

5} , Alan J. Malcolm _{2,

3,

4,

6,

7} , Luzhu Xu _{1,

2,

3,

4,

5} , HeeBong Yang _{2,

3,

4,

6,

7} , Thomas Storwick _{1,

2,

3,

4,

5} , Na Young Kim _{2,

3,

4,

5,

6} , Michael A. Pope _{1,

2,

3,

4,

5}

Affiliation

Hexagonal boron nitride (hBN) is being increasingly used in optoelectronic devices to electronically and/or chemically isolate materials like graphene and carbon nanotubes from the environment or other device components. Solution exfoliation is a scalable method to produce large quantities of nanometer-thick hBN but it remains challenging to integrate these discrete flakes into uniform thin films by conventional solution processing approaches. In this work, we demonstrate how a modified Langmuir–Blodgett coating approach can be used to assemble densely tiled layers of the exfoliated hBN flakes arranged edge-to-edge at the air–water interface. These floating films can be transferred to effectively any solid substrate yielding pure hBN films without utilizing any surfactant or polymer additive. Building films layer-by-layer yields pinhole-free films over large areas (>cm²) with high optical transparency per deposition. The use of room temperature processing makes the approach particularly well-suited for use in transparent and flexible devices.

中文翻译：

兰格缪尔沉积法溶蚀剥离型六方氮化硼的超薄膜

六方氮化硼（hBN）越来越多地用于光电设备中，以将环境中的石墨烯和碳纳米管等材料与环境或其他设备组件进行电子和/或化学隔离。溶液剥离是生产大量纳米级hBN的可扩展方法，但是通过常规溶液处理方法将这些离散的薄片集成到均匀的薄膜中仍然具有挑战性。在这项工作中，我们演示了如何使用改良的Langmuir-Blodgett涂层方法组装在空气-水界面处边对边排列的脱落hBN薄片的致密瓷砖层。这些浮膜可以有效地转移到任何产生纯hBN膜的固体基质上，而无需使用任何表面活性剂或聚合物添加剂。²）每次沉积具有高的光学透明度。使用室温处理使该方法特别适合用于透明和柔性设备。

更新日期：2020-10-16

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