Design, preparation, and characterization of new high‐refractive index hybrid organic–inorganic polysiloxanes: Innovative coatings for optoelectronic applications,Journal of Applied Polymer Science

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Design, preparation, and characterization of new high‐refractive index hybrid organic–inorganic polysiloxanes: Innovative coatings for optoelectronic applications
Journal of Applied Polymer Science ( IF 2.7 ) Pub Date : 2020-09-16 , DOI: 10.1002/app.49877
Sacha Legrand ₁ , Milja Hannu‐Kuure ₁ , Ari Kärkkäinen ₁

Affiliation

The current demand for high‐refractive index materials is very high due to their importance in optoelectronic applications. Such materials already exist in the market, but they present many disadvantages. They might contain toxic metals; their preparation can be challenging or produce high quantity of waste. Consequently, there is an urgent need to produce new friendly coatings with high‐refractive index. Hybrid organic–inorganic polysiloxanes can offer a solution to this problem. They can be easily prepared from nontoxic alkoxy silanes using the sol–gel chemistry process. Herein, a series of new hybrid polysiloxanes are synthesized from the monomer 1–(2–(triethoxysilyl)ethyl)triphenylsilane and other silanes. The preparation of the macromolecules is optimized at both stages of the sol–gel process. The polymers are characterized by gel permeation chromatography and NMR spectroscopy. Spin coating of the materials on silicon wafers, followed by film thickness and refractive index measurements, indicates that the new polysiloxanes can have refractive indexes as high as 1.6 with thicknesses varying from 2200 to 3700 nm. Consequently, it is expected that the new materials described in this report are valuable for optoelectronic applications such as high‐dielectric constant (high‐k) gate oxides, interlayer high‐k dielectrics, or high‐refractive index abrasion resistant coatings.

中文翻译：

新型高折射率杂化有机-无机聚硅氧烷的设计，制备和表征：光电应用的创新涂料

由于其在光电应用中的重要性，目前对高折射率材料的需求非常高。这样的材料已经在市场上存在，但是它们具有许多缺点。它们可能包含有毒金属；它们的制备可能具有挑战性，或者会产生大量废物。因此，迫切需要生产具有高折射率的新型友好涂料。有机-无机杂化聚硅氧烷可以解决此问题。它们可以使用溶胶-凝胶化学工艺轻松地由无毒的烷氧基硅烷制备。本文中，由单体1-（2-（三乙氧基甲硅烷基）乙基）三苯基硅烷和其他硅烷合成了一系列新型杂化聚硅氧烷。溶胶-凝胶过程的两个阶段都优化了大分子的制备。所述聚合物通过凝胶渗透色谱法和NMR光谱法表征。在硅晶片上旋涂材料，然后进行膜厚度和折射率测量，表明新的聚硅氧烷的折射率可高达1.6，厚度在2200至3700 nm之间变化。因此，可以预期的是，本报告中描述的新材料对于诸如高介电常数（高k）栅极氧化物，层间高k电介质或高折射率耐磨涂层。

更新日期：2020-11-17

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