Abstract Lu2O3:Eu scintillation film is one of the most attractive candidate for the hard X-ray imaging, especially for sub-micrometer spatial resolution X-ray detectors. This study was focused on the preparation and characterization of Lu2O3:Eu structured scintillation film on (0 0 1) sapphire substrate by laser chemical vapor deposition (LCVD). The grazing incidence X-ray diffraction (GIXRD) measurement shows that the film with thicknesses of 3 μm is oriented along the (4 1 1) direction. The morphology and luminescent properties, including photoluminescence excitation (PLE), photoluminescence (PL) and PL decay, were measured and discussed. The sub-micrometer spatial resolution was obtained at BL13W1 station at Shanghai synchrotron radiation facility (SSRF).

中文翻译：

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LCVD法制备蓝宝石衬底上Lu2O3:Eu结构闪烁膜的制备、发光特性及X射线成像结果

摘要 Lu2O3:Eu 闪烁膜是硬X 射线成像最有吸引力的候选材料之一，尤其是亚微米空间分辨率X 射线探测器。本研究的重点是通过激光化学气相沉积 (LCVD) 在 (0 0 1) 蓝宝石衬底上制备和表征 Lu2O3:Eu 结构的闪烁膜。掠入射 X 射线衍射 (GIXRD) 测量表明厚度为 3 μm 的薄膜沿 (4 1 1) 方向取向。测量和讨论了形态和发光特性，包括光致发光激发 (PLE)、光致发光 (PL) 和 PL 衰减。亚微米空间分辨率是在上海同步辐射设施 (SSRF) 的 BL13W1 站获得的。