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Microstructural influence of the thermal behavior of arc deposited TiAlN coatings with high aluminum content
Journal of Alloys and Compounds ( IF 5.8 ) Pub Date : 2021-02-01 , DOI: 10.1016/j.jallcom.2020.157205
A.B.B. Chaar , L. Rogström , M.P. Johansson-Jöesaar , J. Barrirero , H. Aboulfadl , N. Schell , D. Ostach , F. Mücklich , M. Odén

Abstract The influence of the microstructure on the thermal behavior of cathodic arc deposited TiAlN coatings was studied as a function of isothermal annealing. Two compositionally similar but structurally different coatings were compared, a Ti0·34Al0·66N0.96 coating with a fine-grain structure consisting of a mixture of cubic (c) and hexagonal (h) phases, and a Ti0·40Al0·60N0.94 coating with a coarse-grain structure of cubic phase. By in situ wide-angle synchrotron x-ray scattering, spinodal decomposition was confirmed in both coatings. The increased amount of internal interfaces lowered the decomposition temperature by 50 °C for the dual-phase coating. During the subsequent isothermal anneal at 1000 °C, a transformation from c-AlN to h-AlN took place in both coatings. After 50 min of isothermal annealing, atom probe tomography detected small amounts of Al (∼2 at.%) in the c-TiN rich domains and small amounts of Ti (∼1 at.%) in the h-AlN rich domains of the coarse-grained single-phase Ti0·40Al0·60N0.94 coating. Similarly, at the same conditions, the fine-grained dual-phase Ti0·34Al0·66N0.96 coating exhibits a higher Al content (∼5 at.%) in the c-TiN rich domains and higher Ti content (∼15 at.%) in the h-AlN rich domains. The study shows that the thermal stability of TiAlN is affected by the microstructure and that it can be used to tune the reaction pathway of decomposition favorably.

中文翻译:

高铝含量电弧沉积 TiAlN 涂层的微观结构影响

摘要 作为等温退火的函数,研究了微观结构对阴极电弧沉积的TiAlN涂层的热行为的影响。比较了两种成分相似但结构不同的涂层,Ti0·34Al0·66N0.96 涂层具有由立方 (c) 和六方 (h) 相的混合物组成的细晶粒结构,以及 Ti0·40Al0·60N0.94具有立方相的粗晶结构的涂层。通过原位广角同步加速器 X 射线散射,在两种涂层中都证实了旋节线分解。内部界面数量的增加使双相涂层的分解温度降低了 50°C。在随后的 1000 °C 等温退火期间,两种涂层都发生了从 c-AlN 到 h-AlN 的转变。等温退火 50 分钟后,原子探针断层扫描在粗晶单相 Ti0 的富含 c-TiN 的域中检测到少量的 Al(~2at.%)和在富含 h-AlN 的域中的少量 Ti(~1at.%) ·40Al0·60N0.94涂层。类似地,在相同条件下,细晶双相 Ti0·34Al0·66N0.96 涂层在富 c-TiN 域中表现出更高的 Al 含量(~5 at.%)和更高的 Ti 含量(~15 at.%)。 %) 在 h-AlN 丰富的域中。研究表明,TiAlN 的热稳定性受微观结构的影响,可用于有利地调整分解反应途径。96 涂层在富含 c-TiN 的域中表现出更高的 Al 含量(~5 at.%),在富含 h-AlN 的域中表现出更高的 Ti 含量(~15 at.%)。研究表明,TiAlN 的热稳定性受微观结构的影响,可用于有利地调整分解反应途径。96 涂层在富含 c-TiN 的域中表现出更高的 Al 含量(~5 at.%),在富含 h-AlN 的域中表现出更高的 Ti 含量(~15 at.%)。研究表明,TiAlN 的热稳定性受微观结构的影响,可用于有利地调整分解反应途径。
更新日期:2021-02-01
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