Abstract The crystalline structures and surface morphologies of the SiO2 and Nb2O5 single-layer films were measured using XRD pattern and FESEM and their optical properties (the refractive indices and extinction coefficients) were measured as a function of optical wavelength. After the refractive indices of the SiO2 and Nb2O5 single-layer films were measured, the thicknesses of the SiO2 and Nb2O5 bi-layer films with 1/4 wavelength (λ) for the blue-light (450 nm) distributed Bragg reflectors were obtained. The SiO2–Nb2O5 bi-layer films (called as one period) with two, four, and six periods on glass substrates was deposited using an E-beam system to fabricate the distributed Bragg reflectors (DBRs). The thickness of each layer of SiO2 and Nb2O5 films in the multilayer structure was measured using FESEM equipped with FIB and TEM. The important novelty is that we constructed an overall transfer matrix and calculated the simulated reflectance spectra by incorporating the variable refractive index and thickness of each layer of SiO2 and Nb2O5 films. Another novelty is that we compared the measured maximum reflectance ratios of the fabricated DBRs with the simulation results obtained from the investigated overall transfer matrix method and Sheppard's approximate equation (maximum reflectance ratio at a specific wavelength).

中文翻译：

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使用电子束沉积制造的蓝光 SiO2–Nb2O5 分布式布拉格反射器的理论和实验结果比较

摘要 使用XRD图谱和FESEM测量了SiO2和Nb2O5单层薄膜的晶体结构和表面形貌，并测量了它们的光学特性（折射率和消光系数）作为光波长的函数。测量了SiO2和Nb2O5单层薄膜的折射率后，得到了1/4波长（λ）的蓝光（450nm）分布布拉格反射器的SiO2和Nb2O5双层薄膜的厚度。使用电子束系统在玻璃基板上沉积具有两个、四个和六个周期的 SiO2-Nb2O5 双层膜（称为一个周期）以制造分布式布拉格反射器（DBR）。使用配备 FIB 和 TEM 的 FESEM 测量多层结构中每层 SiO2 和 Nb2O5 膜的厚度。重要的新颖之处在于我们构建了一个整体传输矩阵，并通过结合每层 SiO2 和 Nb2O5 薄膜的可变折射率和厚度来计算模拟反射光谱。另一个新颖之处是我们将制造的 DBR 的测量最大反射率与从研究的整体传递矩阵方法和 Sheppard 近似方程（特定波长下的最大反射率）获得的模拟结果进行了比较。