当前位置: X-MOL 学术Appl. Surf. Sci. › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Correlated effects of fluorine and hydrogen in fluorinated tin oxide (FTO) transparent electrodes deposited by sputtering at room temperature
Applied Surface Science ( IF 6.3 ) Pub Date : 2021-01-01 , DOI: 10.1016/j.apsusc.2020.147906
María Morán-Pedroso , Raúl Gago , Jaakko Julin , Eduardo Salas-Colera , Ignacio Jimenez , Alicia de Andrés , Carlos Prieto

Abstract The optical and electrical properties of fluorinated tin oxide (FTO) films deposited at room temperature by sputtering have been investigated varying the fluorine content and the hydrogen atmosphere. The complex behavior of the obtained films is disclosed using a wide set of characterization techniques that reveals the combined effects of these two parameters on the generated defects. These defects control the electrical transport (carrier density, mobility and conductivity), the optical properties (band gap and defects-related absorption and photoluminescence) and finally promote the amorphization of the samples. H2 in the sputtering gas does not modify the H content in the films but induces the partial reduction of tin (from Sn4+ to Sn2+) and the consequent generation of oxygen vacancies with shallow energy levels close to the valence band. A variation of up to four orders of magnitude in electrical conductivity is reported in samples with the appropriate fluorine doping and hydrogen fraction in the sputtering gas, maintaining excellent optical transparency. Optimized room temperature grown electrodes reach sheet resistance ~20 Ω/□ and transparency >90%. This room temperature deposition process enables film preparation on flexible organic substrates, such as polyethylene terephthalate (PET), with identical performance of doubtless interest in flexible and large scale electronics.

中文翻译:

氟和氢在室温溅射沉积的氟化氧化锡 (FTO) 透明电极中的相关效应

摘要 研究了在室温下通过溅射沉积的氟化氧化锡 (FTO) 薄膜在改变氟含量和氢气气氛下的光学和电学性能。使用广泛的表征技术揭示了这两个参数对产生的缺陷的综合影响,揭示了所获得薄膜的复杂行为。这些缺陷控制电传输(载流子密度、迁移率和电导率)、光学特性(带隙和缺陷相关的吸收和光致发光),并最终促进样品的非晶化。溅射气体中的 H2 不会改变薄膜中的 H 含量,但会引起锡的部分还原(从 Sn4+ 到 Sn2+)以及随之产生的具有接近价带的浅能级的氧空位。据报道,在溅射气体中具有适当氟掺杂和氢含量的样品中,电导率的变化高达四个数量级,保持了出色的光学透明度。优化的室温生长电极可达到 ~20 Ω/□ 的薄层电阻和 >90% 的透明度。这种室温沉积工艺可以在柔性有机基材上制备薄膜,例如聚对苯二甲酸乙二醇酯 (PET),在柔性和大规模电子产品中具有相同的性能。据报道,在溅射气体中具有适当氟掺杂和氢含量的样品中,电导率的变化高达四个数量级,保持了出色的光学透明度。优化的室温生长电极可达到 ~20 Ω/□ 的薄层电阻和 >90% 的透明度。这种室温沉积工艺可以在柔性有机基材上制备薄膜,例如聚对苯二甲酸乙二醇酯 (PET),在柔性和大规模电子产品中具有相同的性能。据报道,在溅射气体中具有适当氟掺杂和氢含量的样品中,电导率的变化高达四个数量级,保持了出色的光学透明度。优化的室温生长电极可达到 ~20 Ω/□ 的薄层电阻和 >90% 的透明度。这种室温沉积工艺可以在柔性有机基材上制备薄膜,例如聚对苯二甲酸乙二醇酯 (PET),在柔性和大规模电子产品中具有相同的性能。
更新日期:2021-01-01
down
wechat
bug