当前位置: X-MOL 学术Chin. Phys. B › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
A synaptic transistor with NdNiO 3
Chinese Physics B ( IF 1.7 ) Pub Date : 2020-09-13 , DOI: 10.1088/1674-1056/aba60c
Xiang Wang 1, 2 , Chen Ge 1, 2 , Ge Li 1 , Er-Jia Guo 1 , Meng He 1 , Can Wang 1, 2, 3 , Guo-Zhen Yang 1 , Kui-Juan Jin 1, 2, 3
Affiliation  

Recently, neuromorphic devices for artificial intelligence applications have attracted much attention. In this work, a three-terminal electrolyte-gated synaptic transistor based on NdNiO 3 epitaxial films, a typical correlated electron material, is presented. The voltage-controlled metal–insulator transition was achieved by inserting and extracting H + ions in the NdNiO 3 channel through electrolyte gating. The non-volatile conductance change reached 10 4 under a 2 V gate voltage. By manipulating the amount of inserted protons, the three-terminal NdNiO 3 artificial synapse imitated important synaptic functions, such as synaptic plasticity and spike-timing-dependent plasticity. These results show that the correlated material NdNiO 3 has great potential for applications in neuromorphic devices.

中文翻译:

具有NdNiO 3的突触晶体管

近来,用于人工智能应用的神经形态设备引起了很多关注。在这项工作中,提出了一种基于NdNiO 3外延膜(典型的相关电子材料)的三端电解质门控突触晶体管。通过在NdNiO 3通道中通过电解质浇注插入和提取H +离子,可以实现电压控制的金属-绝缘体转变。在2 V栅极电压下,非易失性电导变化达到10 4。通过操纵插入的质子的数量,三末端NdNiO 3人工突触模仿了重要的突触功能,例如突触可塑性和依赖尖峰时间的可塑性。这些结果表明,相关材料NdNiO 3在神经形态装置中具有巨大的应用潜力。
更新日期:2020-09-14
down
wechat
bug