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Effect of the Focusing of a SEM Probe on the Formation of Relief Structure Images
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques Pub Date : 2020-07-07 , DOI: 10.1134/s1027451020030106
Yu. A. Novikov

Abstract

The effect of focusing a scanning electron microscope probe on the formation of relief structure images is studied in secondary slow electron and backscattering electron collection modes. Protrusions and grooves in silicon with a trapezoidal profile and large inclination angles of lateral walls are used in the experiments. In the defocusing process the probe diameter is increased up to 8 times. It is shown that the image obtained in the secondary slow electron mode greatly varies, while the image acquired in the backscattering electron mode remains unchanged within the noise. The areas of signals strongly affected by the SEM probe are specified as well. According to the results, SEM focusing is necessary for only the secondary slow electron collection mode.


中文翻译:

SEM探针聚焦对凸版结构图像形成的影响

摘要

在次级慢速电子和反向散射电子收集模式下,研究了将扫描电子显微镜探针聚焦在浮雕结构图像形成上的作用。实验中使用了梯形轮廓和侧壁大倾角的硅凸起和凹槽。在散焦过程中,探头直径最多增加8倍。可以看出,在次级慢电子模式下获得的图像变化很大,而在反向散射电子模式下获得的图像在噪声范围内保持不变。还指定了受SEM探针强烈影响的信号区域。根据结果​​,SEM聚焦仅对于次级慢电子收集模式是必需的。
更新日期:2020-07-07
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