Abstract

The surface morphology of 100-nm textured Pt films subjected to ion-plasma treatment (IPT) in argon plasma with an Ar-ion energy of 25–200 eV is investigated using a scanning tunneling microscope. As-deposited films are characterized by close values of the surface roughness and average grain size, but their texture strength are different. It is found that IPTs with an ion energy of 25–65 eV lead to increasing roughness, but the roughness of a film with stronger texture is 25–30% less than for a film with weaker texture. This result is caused by a smaller average grain misorientation angle in the case of stronger texture which results in the slower sputtering of grain boundaries. IPT with an ion energy of 200 eV leads to a decrease in the Pt surface roughness by 25% independently of the Pt texture strength.

中文翻译：

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低能离子等离子处理对具有不同晶体纹理强度的Pt膜表面形貌的影响

摘要

使用扫描隧道显微镜研究了氩离子能量为25–200 eV的氩等离子体中经过离子等离子体处理（IPT）的100 nm织构Pt膜的表面形态。所沉积的膜的特征在于表面粗糙度和平均晶粒尺寸的值接近，但是其织构强度不同。已发现离子能量为25–65 eV的IPT会导致粗糙度增加，但是具有较强纹理的膜的粗糙度比具有较弱纹理的膜的粗糙度低25–30％。该结果是由于在较强的织构的情况下较小的平均晶粒取向差角导致的，这导致晶粒边界的溅射较慢。离子能量为200 eV的IPT可使Pt表面粗糙度降低25％，而与Pt织构强度无关。