Oscillatory Behavior in Cobalt Electrodeposition with 3-Mercapto-1-Propanesulfonate,The Journal of Physical Chemistry C

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Oscillatory Behavior in Cobalt Electrodeposition with 3-Mercapto-1-Propanesulfonate
The Journal of Physical Chemistry C ( IF 3.3 ) Pub Date : 2020-09-10 , DOI: 10.1021/acs.jpcc.0c06877
Y. Hu ₁ , Q. Huang ₁

Affiliation

A potential oscillation was observed during galvanostatic deposition of Co in the presence of 3-mercapto-1-propanesulfonate (MPS) and a systematic study was conducted. A suppression effect on Co deposition by MPS was seen in cyclic voltammetry (CV) and such effect was not affected by pH. To fully understand the suppression effect and oscillation mechanism, several influencing factors in the galvanostatic process such as pH, Co²⁺ and MPS concentrations, agitation, and a buffer agent were thoroughly investigated. Moreover, mercaptopropionic acid, an alternative additive with a similar molecular structure as MPS, was used to determine the roles of thiol and sulfonate groups during the oscillation. Based on the experiment results, a kinetically controlled mechanism including a potential-dependent adsorption–desorption of the Co–MPS complex accompanied by the accumulation and dissolution of Co(OH)₂ was proposed.

中文翻译：

3-巯基-1-丙磺酸钴电沉积中的振荡行为

在3-巯基-1-丙烷磺酸盐（MPS）存在的情况下，在钴的恒电流沉积过程中观察到了潜在的振荡，并进行了系统的研究。在循环伏安法（CV）中可以看到MPS对Co沉积的抑制作用，而这种作用不受pH的影响。为了充分了解抑制作用和振荡机理，在恒电流过程中有几个影响因素，例如pH，Co ²⁺并彻底研究了MPS浓度，搅拌和缓冲剂。此外，巯基丙酸是一种具有与MPS相似的分子结构的替代添加剂，用于确定振荡过程中硫醇和磺酸盐基团的作用。基于实验结果，提出了一种动力学控制机制，包括Co-MPS配合物的电位依赖吸附-解吸以及Co（OH）₂的积累和溶解。

更新日期：2020-10-02

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