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Twin-jet electropolishing for damage-free transmission electron microscopy specimen preparation of metallic microwires.
Microscopy Research and Technique ( IF 2.0 ) Pub Date : 2020-09-11 , DOI: 10.1002/jemt.23588
Saeid Pourbabak 1 , Andrey Orekhov 1 , Dominique Schryvers 1
Affiliation  

A method to prepare TEM specimens from metallic microwires and based on conventional twin‐jet electropolishing is introduced. The wire is embedded in an opaque epoxy resin medium and the hardened resin is mechanically polished to reveal the wire on both sides. The resin containing wire is then cut into discs of the appropriate size. The obtained embedded wire is electropolished in a conventional twin‐jet electropolishing machine until electron transparency in large areas without radiation damage is achieved.

中文翻译:

双喷射电抛光技术用于金属微丝的无损透射电子显微镜样品制备。

介绍了一种使用金属微丝制备TEM样品的方法,该方法基于常规的双喷射电抛光。将导线嵌入不透明的环氧树脂介质中,并对硬化的树脂进行机械抛光,以露出导线的两面。然后将含树脂的金属丝切成适当大小的圆盘。将获得的包埋线在常规的双喷射电抛光机中进行电抛光,直到在没有辐射损伤的情况下获得大面积的电子透明性为止。
更新日期:2020-09-11
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