We have developed a real-time dose monitoring system for a low-energy ion-beam facility. Before we developed the monitoring system, the system had given a substantial error of ±23% when we irradiated an ion beam with a dose as much as 3.0 × 1016 cm−2 on the Si substrate. Moreover, a low irradiation dose as small as 1013 cm−2 was scarcely able to be controlled because of a too short irradiation time of several seconds, producing a greater dose error. To develop a real-time dose monitoring system, in this work, we employed a current integrator in conjunction with a beam stopper, by which a dose of 3.0 ×1016 cm−2 can be exactly irradiated on the sample with less than ±6% error, which was ensured by the measurements of Rutherford backscattering spectroscopy.

我们为低能耗离子束设备开发了实时剂量监测系统。在开发监测系统之前，当我们在Si基板上辐照剂量达3.0×1016 cm-2的离子束时，该系统已产生±23％的实质误差。此外，由于几秒钟的太短的照射时间，几乎不能控制低至1013 cm-2的低照射剂量，从而产生更大的剂量误差。为了开发实时剂量监测系统，在这项工作中，我们使用了电流积分器和束塞，通过该束，可以精确地以小于±6％的剂量将3.0×1016 cm-2的剂量照射到样品上误差，这是通过卢瑟福背散射光谱仪的测量来确保的。