当前位置: X-MOL 学术Mech. Solids › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Vacancy Growth of a Faceted Pore in a Crystal via Chernov Mechanism
Mechanics of Solids ( IF 0.6 ) Pub Date : 2020-08-31 , DOI: 10.3103/s0025654420010136
A. V. Redkov , S. A. Kukushkin , A. V. Osipov

Abstract—The vacancy growth of a faceted pore in a crystal via Chernov mechanism is studied. It is assumed that the growth is due to the diffusion of excess vacancies arising in the bulk of the crystal under the influence of mechanical tensile stress. In the framework of the formalism proposed by Chernov, the distribution of vacancies in the crystal near the step and its rate of advance are found. A connection is established between the normal pore growth rate and the applied mechanical stress. The growth due to the advance of a set of equidistant “void” steps as well as due to advance of the spiral step that arose at the exit point of the screw dislocation are considered. The results can be used to analyze the durability of materials subjected constantly to low tensile stresss.

中文翻译:

通过切尔诺夫机制,晶体中的刻面毛孔空位生长

摘要—通过Chernov机理研究了晶体中多面孔的空位生长。可以认为,生长是由于在机械拉伸应力的影响下,晶体主体中产生的多余空位的扩散所致。在切尔诺夫(Chernov)提出的形式主义的框架中,发现了台阶附近晶体中的空位分布及其前进速度。在正常的孔生长速率和所施加的机械应力之间建立了联系。考虑到由于一组等距的“空”阶跃的推进以及由于螺旋错位的出口点处产生的螺旋阶跃的推进而导致的增长。该结果可用于分析不断承受低拉伸应力的材料的耐久性。
更新日期:2020-08-31
down
wechat
bug