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Kinetic modeling of ammonia decomposition at chemical vapor deposition conditions
Journal of Vacuum Science & Technology A ( IF 2.4 ) Pub Date : 2020-08-10 , DOI: 10.1116/6.0000369
Karl Rönnby 1 , Henrik Pedersen 1 , Lars Ojamäe 1
Affiliation  

Kinetic modeling has been used to study the decomposition chemistry of ammonia at a wide range of temperatures, pressures, concentrations, and carrier gases mimicking the conditions in chemical vapor deposition (CVD) of metal nitrides. The modeling shows that only a small fraction of the ammonia molecules will decompose at most conditions studied. This suggests that the fact that the high NH3 to metal ratios often employed in CVD is due to the very low amount of reactive decomposition products being formed rather than due to rapid decomposition of ammonia into stable dinitrogen and dihydrogen as suggested by purely thermodynamic equilibrium models.

中文翻译:

化学气相沉积条件下氨分解的动力学模型

动力学模型已被用来研究氨在广泛的温度,压力,浓度和模拟金属氮化物化学气相沉积(CVD)条件的载气中的分解化学。该模型表明,在大多数研究条件下,只有一小部分氨分子会分解。这表明,经常在CVD中使用的高NH 3与金属之比的事实是由于形成了非常少量的反应性分解产物,而不是由于纯热力学平衡模型表明的那样,氨迅速分解为稳定的二氮和二氢。
更新日期:2020-09-10
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