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Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)2on a nickel oxide surface in atomic layer etching processes
Journal of Vacuum Science & Technology A ( IF 2.4 ) Pub Date : 2020-08-06 , DOI: 10.1116/6.0000293
Abdulrahman H. Basher 1 , Marjan Krstić 2 , Karin Fink 3 , Tomoko Ito 1 , Kazuhiro Karahashi 1 , Wolfgang Wenzel 2 , Satoshi Hamaguchi 1
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Thermal atomic layer etching (ALE) of nickel (Ni) may be performed with a step of thin-layer oxidation of its surface and another step of its removal by gas-phase hexafluoroacetylacetone (hfacH) as an etchant. In this study, adsorption of hfacH and possible formation of volatile nickel hexafluoroacetylacetonate Ni(hfac)2 on a NiO surface were investigated based on the density functional theory (DFT) with more realistic surface material models than those used in the previous study [A. H. Basher et al., J. Vac. Sci. Technol. A 38, 022610 (2020)]. It has been confirmed that an hfacH molecule approaching a NiO surface deprotonates without a potential barrier and adsorbs on the surface exothermically. In addition, stable adsorption of two deprotonated hfacH molecules on a NiO (100) surface was found to occur not on a single Ni atom but over a few Ni atoms instead, which makes the formation of a Ni(hfac)2 complex on the flat surface very unlikely even at elevated temperature. However, if the surface is rough and a Ni atom protrudes from the surrounding atoms, two hexafluoroacetylacetonate anions (hfac) can bond to the Ni atom stably, which suggests a possibility of desorption of a Ni(hfac)2 complex from the surface at elevated temperature. Given the experimentally observed fact that desorption of Ni(hfac)2 complexes typically takes place on a NiO surface at a temperature of ∼300–400 °C, our DFT calculations indicate that the surface roughness of an oxidized Ni surface facilitates the formation and desorption of organometallic complexes Ni(hfac)2, and therefore, the resulting Ni surface after ALE can be smoother than the initial surface.

中文翻译:

原子层蚀刻工艺中六氟乙酰丙酮化镍Ni(hfac)2在氧化镍表面上的形成和脱附

镍(Ni)的热原子层蚀刻(ALE)可以通过其表面的薄层氧化步骤和通过气相六氟乙酰丙酮(hfacH)作为蚀刻剂去除其的另一步骤来进行。在这项研究中,基于密度泛函理论(DFT),研究了hfacH的吸附以及在NiO表面上形成挥发性六氟乙酰丙酮化镍Ni(hfac)2的可能性,其表面材料模型比以前的研究更为实际[AH Basher等。,J。Vac。科学 技术。A 38,022610(2020)]。已经证实,接近NiO表面的hfacH分子在没有势垒的情况下去质子化并且放热地吸附在表面上。此外,两个去质子化的hfacH分子在NiO(100)表面上的稳定吸附不是在单个Ni原子上发生,而是在几个Ni原子上发生,这使得在平面上形成了Ni(hfac)2络合物。即使在高温下,表面也不太可能。然而,如果表面是粗糙的,并从周边原子的镍原子突出,六氟乙酰丙酮2个阴离子(HFAC - )可以结合在Ni原子稳定,这表明镍(HFAC)的解吸的可能性2在高温下从表面形成复合物。根据实验观察到的事实,Ni(hfac)2络合物的解吸通常在温度约为300-400°C的NiO表面上进行,我们的DFT计算表明氧化的Ni表面的表面粗糙度有助于形成和解吸由于有机金属配合物Ni(hfac)2的存在,因此,ALE后所得的Ni表面可以比初始表面光滑。
更新日期:2020-09-10
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