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Monolithic full‐color microdisplay using patterned quantum dot photoresist on dual‐wavelength LED epilayers
Journal of the Society for Information Display ( IF 2.3 ) Pub Date : 2020-09-10 , DOI: 10.1002/jsid.966
Peian Li 1 , Xu Zhang 1 , Yangfeng Li 1 , Longheng Qi 1 , Chak Wah Tang 1 , Kei May Lau 1
Affiliation  

A passive‐matrix monolithic full‐color InGaN light emitting diode (LED) microdisplay with 40 × 40 full‐color pixels is demonstrated. Each full‐color pixel consists of red, green, and blue (RGB) subpixels that have a pitch size of 40 μm × 120 μm. The full‐color microdisplay is monolithically fabricated on blue/green dual‐wavelength LED epilayers, using red quantum dot photoresist as a color converter. Pure RGB emission and a wide color gamut are achieved, as shown by electroluminescence spectra. Full‐color patterns with controllable grayscale and color mixing can be clearly rendered driven by a full‐color microdisplay controller, indicating tremendous potential of this novel approach for full‐color LED microdisplays in the future.

中文翻译:

在双波长LED外延层上使用带图案的量子点光刻胶的单片全彩微型显示器

演示了具有40×40全彩色像素的无源矩阵单片InGaN发光二极管(LED)微型显示器。每个全彩色像素由间距为40μm×120μm的红色,绿色和蓝色(RGB)子像素组成。全彩色微显示器使用红色量子点光刻胶作为颜色转换器,在蓝/绿双波长LED外延层上单片制造。如电致发光光谱所示,可以实现纯RGB发射和宽色域。全彩色微显示器控制器可以清晰地呈现具有可控制的灰度和色彩混合的全彩色图案,这表明该新颖方法在全彩色LED微显示器中具有巨大的潜力。
更新日期:2020-09-10
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