Cubic (c-BN), and hexagonal (h-BN) boron nitride thin films are of interest in many applications and industries because of their unique mechanical, thermal and chemical properties. In this work, we investigate high repetition rate deposition of BN films using femtosecond pulsed laser deposition. Boron nitride (BN) films were deposited on silicon wafers using 800 nm, 100 fs Ti:sapphire femtosecond laser with 2.4 mJ pulse energy and high repetition rate of 1 kHz using a c-BN target. The deposited films were analyzed using transmission electron microscopy (TEM), scanning electron microscope (SEM), and optical profilometer. Nano-indentation tests were performed to measure the hardness of the adhered film. The results indicate the influence of the high repetition rate on the film growth, crystalline arrangement and adhesion. The experimental work is utilized to identify the process parameters that can be used in pulsed laser deposition (PLD) process to grow thick and adherent BN film...

中文翻译：

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飞秒脉冲激光高重复率沉积氮化硼薄膜

立方（c-BN）和六方（h-BN）氮化硼薄膜因其独特的机械，热和化学特性而在许多应用和行业中受到关注。在这项工作中，我们研究了飞秒脉冲激光沉积BN膜的高重复率沉积。氮化硼（BN）膜使用800 nm，100 fs的Ti：蓝宝石飞秒激光，使用c-BN靶，具有2.4 mJ脉冲能量和1 kHz的高重复频率沉积在硅晶片上。使用透射电子显微镜（TEM），扫描电子显微镜（SEM）和光学轮廓仪对沉积的膜进行分析。进行纳米压痕测试以测量粘附膜的硬度。结果表明高重复率对膜生长，晶体排列和粘附的影响。