This work reports the preparation of Ag/Cu-Zn-S nanocomposite thin films using a sol-gel spin coating technique without sulfurization. For comparison, a pure Cu-Zn-S (CZS) sample, as well as CZS embedded with silver nanoparticles of various thicknesses, grown on heated substrates at 280 °C and 320 °C, were well fabricated. Several films like pristine CZS and Ag/CZS with different Ag % (0.5, 1, and 2 %) were deposited on various kinds of substrates like glass, n-type and p-type silicon with 5 and 8 layer thicknesses. The impact of annealing temperature 320 °C of the prepared film on the surface morphology, optical, structural, and electrical properties of the deposited films on various kinds of substrates were investigated. The field emission scanning electron microscopy images displayed homogeneous spreading with a smooth uniform surface of the substrates. Formation of Nano-rods (≈ 600 nm) dimension of the deposited pristine film with 5 layers on n-Si and annealed at 320 °C was observed. The energy dispersive spectroscopy results confirmed that a trace amount of metals was presented in the film. The X-ray diffraction for pristine and Ag/CZS films depicted peaks confirming to the polycrystalline of hexagonal and cubic crystal structure. It was observed that the optical bandgap energy (E_g) reduces with increasing the thickness of the film. The values of the index of refraction (n), high frequency and optical static dielectric constants (ε͚, ε˳) of deposit films on Si and glass substrates through the calculation of E_g as a function of the Ag concentrations were also calculated.

这项工作报告了使用溶胶-凝胶旋涂技术而未硫化的制备Ag / Cu-Zn-S纳米复合薄膜的过程。为了进行比较，我们很好地制作了纯Cu-Zn-S（CZS）样品以及嵌入各种厚度的银纳米颗粒的CZS，它们在280°C和320°C的加热基板上生长。将几种具有不同Ag％（0.5％，1％和2％）的原始CZS和Ag / CZS薄膜沉积在各种基板上，例如玻璃，n型和p型硅，层厚分别为5和8。研究了制备的薄膜的退火温度320°C对沉积在各种基材上的薄膜的表面形态，光学，结构和电性能的影响。场发射扫描电子显微镜图像显示出均匀的散布以及基底的光滑均匀表面。观察到在n-Si上有5层沉积并在320°C退火的原始膜的纳米棒（≈600 nm）尺寸的形成。能量色散光谱结果证实膜中存在痕量金属。原始膜和Ag / CZS膜的X射线衍射图描绘了证实六方晶体和立方晶体结构的多晶峰。观察到光带隙能量（E 原始膜和Ag / CZS膜的X射线衍射图描绘了证实六方晶体和立方晶体结构的多晶峰。观察到光带隙能量（E 原始膜和Ag / CZS膜的X射线衍射图描绘了证实六方晶体和立方晶体结构的多晶峰。观察到光带隙能量（E_g）随着膜厚度的增加而减小。通过计算E _g作为Ag浓度的函数，还计算了Si和玻璃基板上沉积膜的折射率（n），高频和光学静态介电常数（ε͚，ε˳）的值。