In this paper, we report successful fabrication of a gadolinia‐doped ceria (GDC) thin film using atomic layer deposition (ALD) for improving the performance of solid oxide fuel cells (SOFCs). By varying the deposition conditions and adjusting the configuration of the ALD supercycle, the doping ratio of ALD GDC was controlled. The morphology, crystallinity, and chemical composition of ALD GDC thin films were analyzed. ALD GDC showed different surface chemistry, including oxidation states, at different doping ratios. The application of ALD GDC in a SOFC led to an output power density enhancement greater than 2.5 times. With an anodic aluminum oxide (AAO) porous support structure, an ALD GDC thin film SOFC (TF‐SOFC) showed a high power density of 288.24 mW/cm² at an operating temperature of 450°C.

中文翻译：

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GDC阴极功能薄膜的原子层沉积，用于增强氧化物离子的掺入

在本文中，我们报道了使用原子层沉积（ALD）改善固体氧化物燃料电池（SOFC）的性能成功制备了掺ado氧化铈（GDC）薄膜的过程。通过改变沉积条件并调整ALD超循环的构型，可以控制ALD GDC的掺杂率。分析了ALD GDC薄膜的形貌，结晶度和化学组成。ALD GDC在不同的掺杂比下显示出不同的表面化学，包括氧化态。ALD GDC在SOFC中的应用导致输出功率密度提高了2.5倍以上。ALD GDC薄膜SOFC（TF-SOFC）具有阳极氧化铝（AAO）多孔支撑结构，在450°C的工作温度下显示出288.24 mW / cm ²的高功率密度。