The electro-deoxidation of Ta2O5 in molten CaCl2 under N2 atmosphere is a facile way for the in situ surface nitridation of Ta particles. The cell voltage and electrolysis time of Ta2O5 are rationalized to realize the in situ surface nitridation of Ta. All the characterization results including X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM) and elements mapping as well as X-ray photoelectron spectroscopy (XPS) confirm the formation of Ta2N layers on the surface of Ta particles, with the thickness of 3–4[Formula: see text]nm. This method provides a strategy for the facile in situ surface nitridation with N2 as the nitrogen source for the fabrication of core-shell structured catalysts.

中文翻译：

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N2气氛下Ta2O5熔盐电解Ta粉的表面氮化

Ta的电脱氧2○5在熔融的氯化钙中2下 N2气氛是Ta颗粒原位表面氮化的一种简便方法。Ta的电池电压和电解时间2○5被合理化以实现Ta的原位表面氮化。包括 X 射线衍射 (XRD)、扫描电子显微镜 (SEM)、透射电子显微镜 (TEM) 和元素映射以及 X 射线光电子能谱 (XPS) 在内的所有表征结果证实了 Ta 的形成2Ta颗粒表面有N层，厚度为3-4[式：见正文]nm。该方法提供了一种简单的 N 原位表面氮化策略2作为制备核壳结构催化剂的氮源。