This work demonstrates a new nanosphere lithography technique, termed stepwise nanosphere lithography, to create matrices of novel two- and three-dimensional nanostructures. Different sets of nanostructures are placed at desired locations through step-by-step deposition during thermal evaporation onto a substrate surface. Three deposition parameters: (1) number of deposition steps; (2) angle of deposition; and (3) nanosphere mask orientation angle were investigated. By changing these parameters, the ordering, shape, and size of nanostructures were modified accordingly. Two- and three-dimensional nanostructure matrices with different arrangements and symmetries were successfully simulated and fabricated experimentally through a combination of multiple stationary deposition stages with different parameters.

中文翻译：

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逐步纳米球光刻：制造纳米结构的另一种方法

这项工作演示了一种新的纳米球光刻技术，称为逐步纳米球光刻，可以创建新颖的二维和三维纳米结构的矩阵。通过在热蒸发到衬底表面上的逐步沉积，将不同组的纳米结构放置在所需的位置。三个沉积参数：（1）沉积步骤数；（2）沉积角度；（3）研究了纳米球掩模的取向角。通过更改这些参数，纳米结构的有序，形状和大小也得到了相应的修改。通过结合多个具有不同参数的固定沉积阶段，成功地模拟和制造了具有不同排列和对称性的二维和三维纳米结构矩阵。