Abstract—

We have studied chemical–mechanical and dynamic chemical polishing of the surface of single crystals of PbTe and Pb_{1 – x}Sn_xTe solid solutions with bromine-releasing etchants based on aqueous (H₂O₂ + HBr + ethylene glycol)/glycerol solutions. The rates of chemical–mechanical and dynamic chemical polishing have been determined as functions of the dilution of the basic polishing etchant with an organic component. The composition of polishing mixtures and chemical etching conditions have been optimized using microstructural analysis of crystal surfaces, surface roughness measurements, and elemental analysis of sample surfaces.

中文翻译：

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单晶PbTe和Pb 1 – x Sn x Te晶片的化学抛光

摘要-

我们已经研究了基于溴化氢（H ₂ O ₂ + HBr +乙二醇）/甘油溶液的溴释放蚀刻剂对PbTe和Pb _{1 – x} Sn _x Te固溶体单晶表面的化学，机械和动态化学抛光。。已经确定了化学-机械和动态化学抛光的速率是用有机组分稀释基本抛光蚀刻剂的函数。使用晶体表面的微观结构分析，表面粗糙度测量以及样品表面的元素分析，可以优化抛光混合物的成分和化学蚀刻条件。