DLC:Si and DLC:N (diamond-like carbons doped with Si or N) functional layers in different configurations are deposited on polyurethane (PU) for bioengineering applications using CCP (capacitively coupled plasma) discharge generated in the PE CVD (plasma-enhanced chemical vapor deposition) system. Scanning electron microscopy (SEM) observations show that the obtained single and multilayers are continuous and well adherent to the substrates, but they differ in surface morphologies. DLC:Si layers form granular-like outer surfaces, while DLC:N ones a mosaic structure of plain areas. Topography analyses by atomic force microscopy (AFM) and optical profilometry reveal that Si-doped layers are characterized by significantly higher surface roughness (Ra ca. 5 nm) in comparison to N-doped layers (Ra ca. 0.3 nm) and also higher values of profile roughness parameter Rz (up to 32 μm vs. about 13 μm). Energy-dispersive X-ray spectroscopy (EDS) analysis indicates the homogenous chemical composition of the layers. DLC:N layers, are characterized by significantly higher polar component of surface free energy (up to ca. 5.0 mJ/m2). DLC:Si layers exhibit higher values of diiodomethane contact angle (up to ca. 90°) compared with DLC:N layers (up to ca. 55°). The attenuated total reflectance Fourier transform infrared spectroscopic measurements (ATR-FTIR) of the layers reveal that the addition of silicon to the DLC structure increases the content of terminal CHn bonds (n = 1, 2, 3) as well as beneficial Si–H and Si–CHn bonds, which significantly reduce the internal stresses in the layers. Both DLC:Si and DLC:N layers exhibit no cytotoxic effects using the human osteoblast-like cell line and human keratinocytes.

中文翻译：

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基于 DLC:Si 和 DLC:N 的层在聚氨酯上的沉积、形态和功能特性

DLC:Si 和 DLC:N（掺杂有 Si 或 N 的类金刚石碳）功能层沉积在聚氨酯 (PU) 上，用于生物工程应用，使用 PE CVD（等离子体增强型）中产生的 CCP（电容耦合等离子体）放电化学气相沉积）系统。扫描电子显微镜 (SEM) 观察表明，所获得的单层和多层是连续的，并且与基材粘附良好，但它们的表面形态不同。DLC:Si 层形成粒状外表面，而 DLC:N 则是平原区域的马赛克结构。通过原子力显微镜 (AFM) 和光学轮廓仪进行的形貌分析表明，与 N 掺杂层（Ra 约 0. 3 nm）以及更高的轮廓粗糙度参数 Rz 值（高达 32 μm 与约 13 μm）。能量色散 X 射线光谱 (EDS) 分析表明层的均匀化学成分。DLC:N 层的特点是表面自由能的极性分量明显更高（高达约 5.0 mJ/m2）。与 DLC:N 层（最高约 55°）相比，DLC:Si 层表现出更高的二碘甲烷接触角值（最高约 90°）。层的衰减全反射傅里叶变换红外光谱测量 (ATR-FTIR) 表明，在 DLC 结构中添加硅增加了末端 CHn 键 (n = 1, 2, 3) 的含量以及有益的 Si-H和 Si-CHn 键，这显着降低了层中的内应力。DLC:Si 和 DLC：