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Correction to: Laser Induced Dielectric Breakdown for Chemical Vapor Deposition by Hydrogen Reduction of Volatile Boron Halides BCl3 and BF3
Plasma Chemistry and Plasma Processing ( IF 2.6 ) Pub Date : 2020-08-29 , DOI: 10.1007/s11090-020-10107-w
I. B. Gornushkin , P. G. Sennikov , R. A. Kornev , A. A. Ermakov , V. E. Shkrunin

The original version of this article unfortunately contained a mistake in the abstract section and figure 7. The corrections are listed below.

中文翻译:

更正:通过氢气还原挥发性卤化硼 BCl3 和 BF3 进行化学气相沉积的激光诱导介电击穿

遗憾的是,这篇文章的原始版本在摘要部分和图 7 中包含一个错误。更正如下。
更新日期:2020-08-29
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