During the nanoparticle colloid jet polishing process to obtain ultra-smooth surface, cavitation is easy to occur because of the intense fluid turbulence. Cavitation interacts with nanoparticles in the colloid solution, which has a great influence on the processing quality of the ultra-smooth surface. In this paper, the collision between nanoparticles and ultra-smooth surfaces under the micro-jet effect formed by cavitation is studied. Molecular dynamics simulation result shows that the collision of nanoparticles changes the atomic position of the collision region of workpiece, resulting in lattice distortion, coordination number and atomic potential energy increased. The ultrasonic cavitation system is used to prepare the monocrystalline silicon workpiece that effected by nanoparticle colloid cavitation. After the process, the dark spots could be observed on the surface of workpiece by SEM. The dark spots are the traces of the collision between the nanoparticle and workpiece, which verify the molecular dynamics simulation results. XPS detection of the surface of monocrystalline silicon workpiece processed by nanoparticle colloid cavitation has been done and the result is slightly different from the workpiece that have not been processed by cavitation. The difference illustrates that the chemical bonding between nanoparticles and monocrystalline silicon surfaces has formed. The simulation and experimental results show that the cavitation is beneficial to the removal of the material of the workpiece by nanoparticles, but it has an adverse effect on the formation of ultra-smooth surface.

在纳米粒子胶体喷射抛光过程中获得超光滑表面的过程中，由于强烈的流体湍流，很容易发生气穴现象。空化与胶体溶液中的纳米粒子相互作用，这对超光滑表面的加工质量有很大影响。本文研究了在空化形成的微射流作用下纳米粒子与超光滑表面之间的碰撞。分子动力学模拟结果表明，纳米粒子的碰撞改变了工件碰撞区域的原子位置，导致晶格畸变，配位数和原子势能增加。超声空化系统用于制备受纳米粒子胶体空化影响的单晶硅工件。经过这个过程 扫描电镜可在工件表面观察到黑点。黑点是纳米粒子与工件之间碰撞的痕迹，证实了分子动力学模拟结果。已经对通过纳米胶体空化处理的单晶硅工件的表面进行了XPS检测，其结果与未通过空化处理的工件略有不同。差异说明纳米颗粒和单晶硅表面之间已形成化学键。仿真和实验结果表明，空化有利于纳米颗粒去除工件材料，但对超光滑表面的形成有不利影响。黑点是纳米粒子与工件之间碰撞的痕迹，证实了分子动力学模拟结果。已经对通过纳米胶体空化处理的单晶硅工件的表面进行了XPS检测，其结果与未通过空化处理的工件略有不同。差异说明纳米颗粒和单晶硅表面之间已形成化学键。仿真和实验结果表明，空化有利于纳米颗粒去除工件材料，但对超光滑表面的形成有不利影响。黑点是纳米粒子与工件之间碰撞的痕迹，证实了分子动力学模拟结果。已经对通过纳米胶体空化处理的单晶硅工件的表面进行了XPS检测，其结果与未通过空化处理的工件略有不同。差异说明纳米颗粒和单晶硅表面之间已形成化学键。仿真和实验结果表明，空化有利于纳米颗粒去除工件材料，但对超光滑表面的形成有不利影响。已经对通过纳米胶体空化处理的单晶硅工件的表面进行了XPS检测，其结果与未通过空化处理的工件略有不同。差异说明纳米颗粒和单晶硅表面之间已形成化学键。仿真和实验结果表明，空化有利于纳米颗粒去除工件材料，但对超光滑表面的形成有不利影响。已经对通过纳米胶体空化处理的单晶硅工件的表面进行了XPS检测，其结果与未通过空化处理的工件略有不同。差异说明纳米颗粒和单晶硅表面之间已形成化学键。仿真和实验结果表明，空化有利于纳米颗粒去除工件材料，但对超光滑表面的形成有不利影响。差异说明纳米颗粒和单晶硅表面之间已形成化学键。仿真和实验结果表明，空化有利于纳米颗粒去除工件材料，但对超光滑表面的形成有不利影响。差异说明纳米颗粒和单晶硅表面之间已形成化学键。仿真和实验结果表明，空化有利于纳米颗粒去除工件材料，但对超光滑表面的形成有不利影响。