We study the currentless diffusion saturation, metal-thermal reduction, and the electrochemical behaviors of chromium- and silicon-containing melts and establish the conditions of synthesis of chromium silicides in the form of superfine powders and coatings. It is shown that the role of limiting stage of the process of diffusion saturation of chromium, molybdenum, and tungsten with silicon in chloride-fluoride melts is played by the diffusion of silicon atoms in the solid phase. In the course of currentless transfer of silicon to metals of group VIB, silicide coatings are formed on their surfaces. The combined reduction of chromium (III) chloride and sodium fluorine-silicate by metallic sodium or magnesium makes it possible to obtain silicide powders. We formulate the conditions required for getting powders of chromium silicides by electrolysis of chloride-fluoride melts containing fluorine-silicate and potassium chromate. The oxidation resistance of the obtained silicide powders is explained by the formation of silicon-oxide layers on their surfaces.

中文翻译：

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离子熔体中铬硅化物的合成

我们研究了无电流扩散饱和、金属热还原以及含铬和硅熔体的电化学行为，并建立了超细粉末和涂层形式的硅化铬的合成条件。结果表明，硅原子在固相中的扩散起到了铬、钼、钨在氯化物-氟化物熔体中与硅的扩散饱和过程的限制阶段的作用。在硅无电流转移到 VIB 族金属的过程中，在其表面形成硅化物涂层。氯化铬 (III) 和氟硅酸钠通过金属钠或镁的联合还原，可以获得硅化物粉末。我们制定了通过电解含有氟硅酸盐和铬酸钾的氯化物-氟化物熔体来获得硅化铬粉末所需的条件。获得的硅化物粉末的抗氧化性是通过在其表面形成氧化硅层来解释的。