This paper introduces a novel method to reduce the voltage stress experienced by 320 V/1 kW/13.56 MHz electrical variable capacitor (EVC) circuits with an asymmetrical switch configuration applied in the impedance matching circuits of RF plasma systems. The proposed method employs a symmetrical switch configuration in place of the asymmetrical switch configuration in each of the capacitor legs in an EVC circuit. The symmetrical switch configuration reduces the voltage stress in the EVC circuit due to symmetrical charging and discharging modes. As a result, the proposed circuit can be used in etching systems. The major idea is verified by simulation and experimental results, which successfully demonstrate that the voltage stress on the switch of an EVC circuit is reduced by more than 35%.

中文翻译：

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使用对称开关配置的可变电电容器用于降低射频等离子体系统中的开关电压

本文介绍了一种减少 320 V/1 kW/13.56 MHz 电气可变电容器 (EVC) 电路所承受的电压应力的新方法，该电路具有应用于射频等离子体系统阻抗匹配电路的非对称开关配置。所提出的方法采用对称开关配置代替EVC电路中每个电容器支路中的非对称开关配置。由于对称的充电和放电模式，对称开关配置降低了 EVC 电路中的电压应力。因此，所提出的电路可用于蚀刻系统。通过仿真和实验结果验证了主要思想，成功地证明了EVC电路开关上的电压应力降低了35%以上。