In situ synthesis of a highly cross-linked polymethacrylimide ultrathin film on a silicon wafer with applicable dielectric, thermal, and mechanical properties,Thin Solid Films

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In situ synthesis of a highly cross-linked polymethacrylimide ultrathin film on a silicon wafer with applicable dielectric, thermal, and mechanical properties
Thin Solid Films ( IF 2.0 ) Pub Date : 2020-10-01 , DOI: 10.1016/j.tsf.2020.138308
Yang Liu , Yutong Han , Lishuang Xiong , Tao Hang , Huiqin Ling , Anmin Hu , Liming Gao , Yunwen Wu , Ming Li

Abstract Polymethacrylimide (PMI) is a potential dielectric film for silicon-based microelectronics due to its good mechanical, thermal, and dielectric properties. However, the direct synthesis of an ultrathin PMI film on a silicon substrate remains challenging. In this paper, an in situ synthesis method has been developed to prepare ultrathin PMI (

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