Abstract Carbon nanoparticles (CNPs) were synthesized using Ar + CH4 multi-hollow plasma chemical vapor deposition. The deposition flux of CNPs to a substrate was studied as a function of the plasma discharge time t and the distance L between the plasma and the substrate. CNPs were not deposited for L = 60 and 80 mm, whereas they were deposited for L = 100, 120 and 140 mm. The mean diameter of CNPs was 25 nm irrespective of L. For L = 120 and 140 mm, the flux gradually increased until t = 30 min and then became constant, indicating that thermophoretic force drives CNPs' deposition. Raman spectroscopy showed that a-C:H films were formed for L ≤ 80 mm, while polymer CNPs were predominant deposits for L ≥ 100 mm.

中文翻译：

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Ar+CH4多空心等离子化学气相沉积法合成碳纳米颗粒的尺寸和通量

摘要 采用 Ar + CH4 多空心等离子体化学气相沉积法合成了碳纳米粒子 (CNPs)。作为等离子体放电时间 t 和等离子体与基板之间的距离 L 的函数，研究了 CNP 到基板的沉积通量。CNP 在 L = 60 和 80 mm 时未沉积，而在 L = 100、120 和 140 mm 时沉积。CNP 的平均直径为 25 nm，与 L 无关。对于 L = 120 和 140 mm，通量逐渐增加，直到 t = 30 分钟，然后变得恒定，表明热泳力驱动 CNP 的沉积。拉曼光谱表明 aC:H 薄膜在 L ≤ 80 mm 时形成，而聚合物 CNP 是 L ≥ 100 mm 的主要沉积物。